Gas distribution device of optical thin film plasma enhanced atomic layer deposition equipment

Abstract

The invention relates to the technical field of film preparation, in particular to a gas distribution device of optical thin film plasma enhanced atomic layer deposition equipment. The gas distribution device of the optical thin film plasma enhanced atomic layer deposition equipment is characterized by comprising a source gas distribution pipe and a gas dispersing mechanism, wherein a gas outlet is formed in the source gas distribution pipe; and the gas dispersing mechanism is positioned on a gas outlet path of the gas outlet formed in the source gas distribution pipe. The gas distribution device of the optical thin film plasma enhanced atomic layer deposition equipment has the advantages that 1) multiple types of film layers with different materials in a single plasma enhanced atomic layer deposition chamber can be simultaneously produced; 2) gas flow uniform distribution in the process chamber can be realized, and moreover, different source gases can be rapidly blown and switched; 3)the film layer uniformity and film layer optical constant of a workpiece can be rapidly adjusted; and 4) the device is simply and reasonably structured, is convenient to mount and maintain in the later period and is suitable for being popularized.

Description

technical field [0001] The invention relates to the technical field of thin film preparation, in particular to a gas distribution device for plasma enhanced atomic layer deposition equipment for optical thin films. Background technique [0002] For traditional atomic layer deposition equipment, it is often only used to prepare simple single-layer films, such as SiO 2 or Al 2 o 3 single coating. Therefore, in the process chamber of the atomic layer deposition equipment, there is often only a gas distribution system related to a simple single film layer. Optical films usually contain two or more layers, so the requirements for the gas distribution system that directly affect the film formation effect are significantly increased; for example, optical films require uniformity of optical constant refractive index, absorption rate, and thickness, etc. Higher; while the gas distribution system of traditional atomic layer deposition equipment can no longer meet the production ne...

AI Technical Summary

Problems solved by technology

Therefore, in the process chamber of atomic layer deposition equipment, there are often only gas distribution systems related to simple single film layers.

Optical films usually contain two or more layers, so the requirements for the gas distribution system that directly affect the film formation effect are significantly increased; for example, optical films require uniformity of optical constant refractive index, absorption rate, and thickness, etc. Higher; while the gas distribution system of traditional atomic layer deposition equipment can no longer meet the production needs of optical thin films

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