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High-damage-threshold laser film process technical method

A technology of high damage threshold and laser thin film, which is applied in metal material coating technology, optics, optical components, etc., can solve the problem of low anti-laser damage threshold, achieve high linear and nonlinear optical performance, good fastness performance, Effect of Broad Spectral Transmittance

Inactive Publication Date: 2020-09-18
SOUTH WEST INST OF TECHN PHYSICS +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] The technical problem to be solved by the present invention is how to provide a high damage threshold laser thin film process technology to overcome the low laser damage threshold of the conventional laser thin film plating technology in the visible light and near-infrared bands. shortcoming

Method used

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  • High-damage-threshold laser film process technical method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0053] The design curve of the anti-laser anti-reflection coating system designed with the quartz substrate as sample 1 is figure 1 , and the geometric thicknesses are listed in Table 1. Using quartz as the optical substrate material, an optimized anti-reflection film system meeting the technical index requirements of the present invention is designed by using an optical thin film design software (TFCalc). The optically processed quartz substrate is coated on its surface. The film thickness calculation module uses the TFC film system design software to design the quartz as the substrate, M is Al 2 o 3 As substrate film material, H is HfO 2 High refractive index film material, L is SiO 2 Low-refractive-index film material (the above M, H, and L are granular film materials with a purity of 99.99%). Calculate the geometric thickness value of each layer of the film system based on the quartz substrate and arrange the geometric thickness in order as follows:

[0054] Table 1 ...

Embodiment 2

[0073] The design of the anti-laser anti-reflection film system using the K9 substrate as sample 2 includes the following steps.

[0074] (1) take K9 as base material, utilize optical thin film design software (TFCalc) to design the optimization anti-reflection film system that meets the technical index requirement of the present invention, the K9 substrate through optical processing is coated on its surface, calculate each with film system design formula The geometric thickness values ​​of the layers are listed in order. Based on K9, M is Al 2 o 3 As substrate film material, H is HfO High refractive index film material, L is SiO Low refractive index film material, (above M, H, L are the granular film material of purity 99.99%). The experimental records of the film geometric thickness of the K9 substrate are listed as follows:

[0075] Table 2

[0076]

[0077] (2) process step (2) is repeated in embodiment 1; Just fixed cleaning time is as follows: A: cleaning solution...

Embodiment 3

[0083] The design of the anti-laser anti-reflection film system based on quartz and K9 as sample 3 includes the following steps.

[0084] (1) take K9 as base material, utilize optical thin film design software (TFCalc) to design the optimization anti-reflection film system that meets the technical index requirement of the present invention, the K9 substrate through optical processing is coated on its surface, calculate each with film system design formula The geometric thickness values ​​of the layers are listed in order. Based on K9, M is Al 2 o 3 As substrate film material, H is HfO 2 High refractive index film material, L is SiO 2 Low-refractive-index film material (the above M, H, and L are granular film materials with a purity of 99.99%). The experimental records of the film geometric thickness of the quartz and K9 substrates are listed as follows:

[0085] table 3

[0086]

[0087] (2) Repeat process step (2) in embodiment 1; Just fix cleaning time as follows: A...

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Abstract

The invention relates to a high-damage-threshold laser film technological method, and belongs to the field of optical film plating. The invention aims to overcome the defect that the laser damage resistance threshold of a laser film plated in visible light and near-infrared bands by a conventional laser film plating technology is relatively low. Quartz or K9 is used as a coating substrate, sapphire is used as a substrate film material M, HfO2 is used as a high-refractive-index film material H, SiO2 is used as a low-refractive-index film material L, and TFC is used for giving geometric thicknesses and film system sequence calculation results of all layers of film systems; ultrasonic cleaning and heating baking are carried out on the coating substrate; in an optical film layer bonding bottoming process and a stress matching process, three film materials are sequentially put into an electronic gun evaporation source crucible boat, and then a coating process is completed according to the geometric thickness of each layer of film system and the sequence of the film systems; and the coating substrate is bombarded by using an ion source before coating and in the coating process. The filmlayer is hard, firm, excellent in laser damage resistance and good in permeability, and can be used for a long time in a severe field environment.

Description

technical field [0001] The invention belongs to the field of coating optical thin films, and in particular relates to a high damage threshold laser thin film process technology method. Background technique [0002] In the prior art, optical thin films are mainly divided into anti-reflection films, high-reflection films, spectroscopic films, cut-off filter films, band-pass filter films, and the like. Among them, laser film is the best way to improve the transmittance (or reflectivity) of light energy in the specified band in the visible and near-infrared laser bands, and has become the most widely used, most used, and largest output of all optical film systems. film system. Anti-reflection coating, also known as anti-reflection coating, is an optical film deposited on the surface of optical material components to reduce surface reflection and increase the transmittance of the optical system. With the development of modern optics, the application of optical systems is increa...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/115C23C14/08C23C14/10C23C14/30C23C14/02C23C14/58
CPCC23C14/022C23C14/081C23C14/083C23C14/10C23C14/221C23C14/30C23C14/5806G02B1/115
Inventor 王平秋魏涛林先勇何开伦杨柳张志斌王金龙于清代礼密姚德武游中华刘卫强余小燕杨洋何坚吴杨海邓漾赵龙
Owner SOUTH WEST INST OF TECHN PHYSICS
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