Displacement measuring device, displacement measuring method and photoetching equipment

Abstract

The invention provides a displacement measuring device, a displacement measuring method and photoetching equipment. The displacement measuring device comprises a light source module, a diffraction element, a reading head assembly, an optical detection module and a signal analysis module; the reading head assembly is used for receiving two input light beams generated by the light source module andguiding the light beams to parallelly contact with the diffraction element and to be diffracted, and guiding and combining the diffracted input beams to form at least one output beam, wherein each output light beam comprises diffracted light signals which are emitted from the same light spot position of the diffraction element, are consistent in direction and respectively correspond to the two input light beams; and the displacement information of the diffraction element can be obtained according to the phase change information of interference signals of each output light beam. According to the displacement measurement device and the displacement measurement method, independent displacement measurement in different directions can be realized, wide-angle adaptive displacement measurement can be realized, and nonlinear errors can be reduced. The photoetching equipment comprises the displacement measuring device.

Description

technical field [0001] The present invention relates to the technical field of displacement measurement, in particular to a displacement measurement device, a displacement measurement method and a photolithographic equipment. Background technique [0002] In the manufacturing, processing and application of precision machinery, the cooperation of displacement-sensitive measuring devices or sensing devices is required. For example, high-resolution , High-precision displacement measuring device (or displacement sensor). Taking integrated circuits as an example, with the rapid development of integrated circuits in the direction of large-scale and high integration, the requirements for overlay accuracy of lithography machines are getting higher and higher. Correspondingly, obtaining the position information of workpiece tables and mask tables The accuracy also increases accordingly. [0003] Nano-measurement technology, including nano-scale displacement measurement, has develop...

AI Technical Summary

Problems solved by technology

[0005] However, the existing grating ruler-based displacement measurement system still has problems such as the displacement measurement in the horizontal direction and the vertical direction are not independent (there is a coupling relationship, which requires algorithm decoupling), the angle tolerance is small, and there are more common optical path structures in the read head. Large nonlinear error and other problems

Images