Wafer cleaning machine for physiotherapy instrument production

Abstract

The invention discloses a wafer cleaning machine for physiotherapy instrument production. The wafer cleaning machine structurally comprises caster wheels, a case, a drain pipe, a case cover, a cleaning mechanism and a control panel. The caster wheels are mounted at the lower end of the case, the drain pipe is embedded into the inner side of the case, the case cover is horizontally mounted at the upper end of the case, the cleaning mechanism is embedded into the inner side of the case, and the control panel is mounted on the front surface of the case. The cleaning mechanism comprises an outer case body, an ultrasonic transducer, an internal edge-protecting structure, a cleaning cavity, an auxiliary cleaning structure and a rotating wheel. The ultrasonic transducer is mounted in the inner side of the outer case body in an embedded manner, the internal edge-protecting structure is embedded into the inner side of the outer case body, the cleaning cavity is formed in the inner side of the internal edge-protecting structure, and the lower end of the auxiliary cleaning structure is mounted in the inner side of the outer case body in an embedded manner. As the internal edge-protecting structure is arranged in the inner side of the outer case body, a part in contact with a wafer is buffered while the wafer is cleaned all around to prevent collision and scratches of the wafer, so that aneffect of manufacturing an integrated circuit by the wafer is better improved.

Description

technical field [0001] The invention belongs to the field of wafer processing, and in particular relates to a wafer cleaning machine for the production of physiotherapy instruments. Background technique [0002] Physiotherapy instrument, also known as physical therapy instrument, mainly uses equipment to act on physical factors on the human body to achieve the effect of treatment, and the circuit in the physiotherapy instrument needs to use wafers to make integrated circuits to make the equipment run. Therefore, crystal The circle plays a big role in it, and the wafer needs to be cleaned after the production is completed in order to play a better role. If the wafer is not cleaned cleanly or there are scratches on the surface that affect the smoothness of the wafer surface, it will affect the smoothness of the wafer surface. To the working effect of physical therapy instrument, but there are following deficiencies in the prior art: [0003] Since the wafer is round and needs...

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Problems solved by technology

[0005] Aiming at the deficiencies in the prior art, the object of the present invention is to provide a wafer cleaning machine for the production of physiotherapy instruments, to solve the problems in the prior art that the wafers are round and need to be cleaned in all directions when using ultrasonic waves for cleaning. In this process, the upper surface will be blocked and cannot be cleaned. When using the cleaning brush for auxiliary cleaning, the cleaning brush will touch the wafer or drive the wafer to the outside to contact the inner wall of the cleaning tank, resulting in scratches on the surface of the wafer. marks, which affect the effect of the wafer when it is made into an integrated circuit, and then make the working effect of the physiotherapy instrument poor.

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