Indoor cultivation device for study of shade tolerance of corn varieties
A cultivation device and a technology of negative resistance, which is applied in the field of indoor cultivation devices for the study of negative resistance of corn varieties, can solve the problems of insufficient real and accurate data, long planting cycle, and large changes in natural conditions, etc., and achieve shortened test cycle and high survival rate , The effect of pure culture medium
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0023] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0024] see Figure 1-5 , the present invention provides the following technical solutions: a kind of indoor cultivation device for the negative resistance research of maize varieties, comprising: an incubator 1, the bottom of the incubator 1 is provided with at least four support legs 11, and the inside of the incubator 1 is provided with accommodating cavity, and the inner wall of the incubator 1 is provided with at least two vertically distributed alveoli 14...
PUM
Property | Measurement | Unit |
---|---|---|
Height | aaaaa | aaaaa |
Thickness | aaaaa | aaaaa |
Height | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com