Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Indoor cultivation device for study of shade tolerance of corn varieties

A cultivation device and a technology of negative resistance, which is applied in the field of indoor cultivation devices for the study of negative resistance of corn varieties, can solve the problems of insufficient real and accurate data, long planting cycle, and large changes in natural conditions, etc., and achieve shortened test cycle and high survival rate , The effect of pure culture medium

Inactive Publication Date: 2020-04-28
TIANJIN ZHONGTIAN DADI SCI & TECH CO LTD
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The existing technology generally conducts shading tests in the field, but due to the long planting cycle and large changes in natural conditions, the obtained data is not true and accurate enough, resulting in many tests and a long cycle, while the existing indoor cultivation devices are generally for seedling cultivation device, unable to accommodate the needs of negative resistance tests

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Indoor cultivation device for study of shade tolerance of corn varieties
  • Indoor cultivation device for study of shade tolerance of corn varieties
  • Indoor cultivation device for study of shade tolerance of corn varieties

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0023] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0024] see Figure 1-5 , the present invention provides the following technical solutions: a kind of indoor cultivation device for the negative resistance research of maize varieties, comprising: an incubator 1, the bottom of the incubator 1 is provided with at least four support legs 11, and the inside of the incubator 1 is provided with accommodating cavity, and the inner wall of the incubator 1 is provided with at least two vertically distributed alveoli 14...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Heightaaaaaaaaaa
Thicknessaaaaaaaaaa
Heightaaaaaaaaaa
Login to View More

Abstract

The invention belongs to the technical field of agricultural product cultivation, and particularly relates to an indoor cultivation device for study of shade tolerance of corn varieties. The indoor cultivation device for study of shade tolerance of corn varieties includes an incubator and a bottom limiting plate, wherein at least four support legs arranged at the bottom of the incubator, an accommodating cavity is formed in the incubator, and at least two vertically-distributed tooth slots are formed in the inner wall of the incubator; and upwardly extending slide rods are fixed at four corners of the incubator. A cultivation liquid in the incubator is used for cultivating corn seedlings and grown corn seedlings, the culture medium is pure, no easy interference is caused by external natural conditions, and the survival rate is high; since the incubator is provided with the bottom limiting plate which can be adjusted vertically, the seedlings can be limited through a limiting sleeve I,and the support height of the seedlings can be improved continuously through adjustment of the height of a movable limiting plate and application of different limiting sleeves during growth of the seedlings, and a shading effect can be achieved through shade cloth which is hung on the top plate, so that experiments are finished.

Description

technical field [0001] The invention belongs to the technical field of cultivating agricultural products, and in particular relates to an indoor cultivating device used for research on negative tolerance of maize varieties. Background technique [0002] Field experiments were conducted to study the changes in the morphology, physiology and yield traits of maize varieties under shading treatment. The results showed that compared with natural light, shading treatment reduced the plant height, stem diameter, prolonging the interval between male and female, and reducing the net photosynthetic rate. Decrease in specific leaf weight, decrease in aboveground dry matter, shortening and thinning of ears, decrease in cob diameter, decrease in number of grains in a row, and significant decrease in grain yield, among which the interval between sexes, net photosynthetic rate, specific leaf weight and grain number in a row were changed There is a significant or extremely significant corre...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): A01G31/06
CPCA01G31/06Y02P60/21
Inventor 张烈张若鹏
Owner TIANJIN ZHONGTIAN DADI SCI & TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products