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Heater and preparation method thereof

A heater and pyrolysis technology, applied in the direction of ohmic resistance heating, heating element materials, ohmic resistance heating parts, etc., can solve the problems of prolonging the cooling time, high power requirements, and easy delamination, etc., to reduce thermal expansion Coefficient difference, simplified temperature control program, and the effect of solving stratification problems

Active Publication Date: 2020-01-07
博宇(天津)半导体材料有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] (1) There are some limitations. The pyrolytic graphite conductive ceramic used in this kind of heater has a high temperature dependence of resistance, and the resistance will drop significantly with the increase of temperature, resulting in the ceramic heating element for the equipment. The power requirements are high, and it is also necessary to set a fixed temperature rise program to control the temperature rise of the heating element to ensure the realization of the evaporation process
[0007] (2) In the prior art, the conductive layer of the heater is a pyrolytic graphite layer. This kind of heater requires three CVD depositions to be successfully prepared, and the thermal expansion coefficient of the pyrolytic graphite layer and the pyrolytic boron nitride layer at high temperature is twice the same , delamination is very easy to occur when the temperature is lowered. At present, the delamination can only be weakened by prolonging the cooling time or thinning the coating of pyrolytic graphite, so that the production yield of the whole line is extremely low.
[0008] The above causes the cost of this kind of heater to be much higher than the cost of metal heating wires such as tantalum and tungsten. When manufacturers consider the overall cost, most of them are unwilling to use this kind of ceramic heating element, so the heating element currently used in the evaporation industry Most of the elements are still metal heating elements

Method used

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  • Heater and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0070] Using nitrogen as a carrier gas, the BCl 3 and NH3 into the heated deposition furnace, control BCl 3 and NH 3 The volume ratio is 2.5:1, the reaction chamber temperature is 1600°C, and the vacuum degree is 133pa. Pyrolytic boron nitride with a thickness of 1.5mm is deposited on the surface of a conventional graphite mold, and then the above-mentioned pyrolytic boron nitride substrate is raised under vacuum. The temperature is raised to 1950°C and kept for 3 hours to form pyrolytic boron nitride used as a heater substrate.

[0071] Fix the boron nitride substrate on the rotating frame of the sandblasting equipment, turn on the equipment to rotate at a speed of 10r / min, and then use corundum sand with a mesh number of 120 for surface sandblasting, with a sandblasting pressure of 0.2MPa and a sandblasting distance of 250mm, the surface roughness of the blasted substrate is 3.42μm.

[0072] Then hang the boron nitride substrate processed in 2 into the CVD equipment for t...

Embodiment 2

[0077]Using nitrogen as a carrier gas, the BCl 3 and NH3 into the heated deposition furnace, control BCl 3 : NH 3 =2.5:1, the temperature of the reaction chamber is 1600°C, the degree of vacuum is 133pa, deposit and form pyrolytic boron nitride with a thickness of 1.5mm on the surface of a conventional graphite mold, and then raise the temperature of the above pyrolytic boron nitride matrix under vacuum to 1950°C, heat preservation for 3 hours to form pyrolytic boron nitride used as a heater substrate.

[0078] Fix the boron nitride substrate on the rotating frame of the sandblasting equipment, turn on the equipment to rotate at a speed of 10r / min, and then use corundum sand with a mesh number of 120 for surface sandblasting, with a sandblasting pressure of 0.2MPa and a sandblasting distance of 250mm, the surface roughness of the blasted substrate is 3.42μm.

[0079] Then hang the boron nitride substrate processed in 2 into the CVD equipment for the deposition of surface co...

Embodiment 3

[0082] Using nitrogen as a carrier gas, the BCl 3 and NH3 into the heated deposition furnace, control BCl 3 : NH 3 =2.5:1, the temperature of the reaction chamber is 1600°C, the degree of vacuum is 133pa, deposit and form pyrolytic boron nitride with a thickness of 1.5mm on the surface of a conventional graphite mold, and then raise the temperature of the above pyrolytic boron nitride matrix under vacuum to 1950°C, heat preservation for 3 hours to form pyrolytic boron nitride used as a heater substrate.

[0083] Fix the boron nitride substrate on the rotating frame of the sandblasting equipment, turn on the equipment to rotate at a speed of 10r / min, and then use corundum sand with a mesh number of 120 for surface sandblasting, with a sandblasting pressure of 0.2MPa and a sandblasting distance of 250mm, the surface roughness of the blasted substrate is 3.42μm.

[0084] Then hang the boron nitride substrate processed in 2 into the CVD equipment for the deposition of surface c...

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Abstract

The invention discloses a heater and a preparation method thereof. The heater comprises a pyrolytic boron nitride substrate (1), a conducting layer (2) and an insulating layer (3), wherein the conducting layer (2) and the insulating layer (3) are sequentially arranged on the surface of the substrate (1) in a stacked mode; and the conducting layer (2) comprises pyrolytic graphite doped with boron carbide; the mass of the boron carbide is 0.1%-50% of that of the new conducting layer. According to the embodiments of the invention, the new conducting layer is arranged in the heater; the differencebetween the expansion coefficient of the new conducting layer and the expansion coefficients of the insulating layer and the substrate is small, so that a layering phenomenon is not liable to occur.Moreover, the resistance of the new conducting layer does not fluctuate greatly along with the rise of temperature, so that a heating effect is good. With the heater and the preparation method thereofof the invention adopted, the problem of the resistivity negative temperature characteristic of the pyrolytic graphite conductive coating is solved; the thermal expansion coefficient difference of aconducting coating and a boron nitride substrate in the prior art is reduced; the temperature control procedure of the heater can be simplified; and the layering problem of the conducting coating canbe solved.

Description

technical field [0001] The invention relates to the technical field of materials, in particular to a heater and a preparation method thereof. Background technique [0002] At present, some heating elements are often used in industrial production to heat raw materials. In terms of solar thin film battery manufacturing, OLED flexible display panels, and the production of some thin film materials or products, various heating elements are inseparable. The industry also has special requirements for heating elements. For example, in the vacuum evaporation process of making solar thin film batteries and OLED flexible panels, because it is produced in a high vacuum environment, the requirements for heating elements are extremely stringent. In order to ensure the uniform diffusion of evaporation materials and avoid the service life of the charging container being affected by excessive local temperature, the heating element itself is required to have good temperature uniformity; in or...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05B3/14H05B3/18H05B3/02
CPCH05B3/145H05B3/18
Inventor 何军舫
Owner 博宇(天津)半导体材料有限公司
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