Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Automatic layout method based on critical polygonal plates

A critical polygon, automatic arrangement technology, applied in the fields of genetic laws, genetic models, data processing applications, etc., can solve the problem of low utilization rate of plates, and achieve the effect of reducing the layout time and improving the utilization rate of plates.

Pending Publication Date: 2019-11-15
TIANJIN UNIV
View PDF1 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although this layout method is fast, the plate utilization rate will be very low

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Automatic layout method based on critical polygonal plates
  • Automatic layout method based on critical polygonal plates
  • Automatic layout method based on critical polygonal plates

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0057] Find the critical polygon between two parts.

[0058] see figure 1 , figure 1 It is a schematic diagram of two irregular plate parts, and their reference points are shown in the figure;

[0059] Critical polygon definition: given two polygons A and B, polygon A is fixed, polygon B rotates around polygon A (during this period, B and A keep at least one point of contact, and B cannot rotate), select the A point is used as a reference point (usually the bottom leftmost vertex of B is selected), and the polygon formed by the motion trajectory of the reference point is the critical polygon of B relative to A, which is denoted as NFP AB ;

[0060] Regarding the movement of polygon B around A, there are two main considerations: the determination of the movement direction and the determination of the movement distance.

[0061] There are three situations for judging the moving direction of B:

[0062] If vertex A of polygon A i and vertex B of polygon B j contact, find t...

Embodiment 2

[0072] Determine where parts can be drained.

[0073] Part A is the discharge initial part;

[0074] Obtain the critical polygons of parts B and A;

[0075] Limit the dischargeable position of part B to each vertex of the critical polygon;

[0076] Drain part B.

[0077] Among them, the positions of parts A and B are Figure 4 dotted line position;

[0078] The solution steps of the algorithm for the dischargeable position of part C are as follows:

[0079] Obtain the critical polygons of part C and part A, and obtain the critical polygons of part C and part B; for example image 3 shown;

[0080] From the definition of the critical polygon, it can be seen that when the reference point of part C is placed on the side of the critical polygon, it can ensure that part C is close to and does not overlap with its relative parts.

[0081] 2 critical polygons at sheet positions such as Figure 4 shown;

[0082] In order to increase the rationality of discharge, in addition t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an automatic layout method based on a critical polygonal plate, which comprises the following steps: reading a part CAD drawing, and identifying and storing information of eachpart; solving critical polygons among all the parts through a moving collision method and a Midget-Kovski vector sum method; determining a dischargeable point of each to-be-discharged part based on the obtained critical polygon; and performing global optimization search on the part arrangement sequence by utilizing a genetic algorithm so as to determine the optimal arrangement sequence of the parts. Compared with traditional automatic plate arrangement, the plate utilization rate is increased, the part arrangement time is shortened, complex information such as part holes is considered, and the method is more practical and stable.

Description

technical field [0001] The invention relates to the field of computer-aided nesting, in particular to an automatic nesting method based on a critical polygon plate. Background technique [0002] The layout problem is to place some parts and materials that make up the product in the production through certain methods and constraints in the specified raw materials, so as to keep the parts or materials intact while saving the use of raw materials as much as possible. With the development of industry and the progress of science and technology, more and more resources are used in industrial production, and saving resources and reducing production costs are more and more respected in today's society. [0003] For layout, the manual method was mainly used in the early stage, which not only failed to save raw materials, but also took more time. The method of computer-aided layout can solve the problems of traditional manual methods, so it has gradually become the mainstream of indu...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G06F17/50G06Q10/04G06N3/12
CPCG06Q10/043G06N3/126
Inventor 柯于河郭伟王磊安蔚瑾
Owner TIANJIN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products