Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Wear-resistant nanometer thermal insulation film manufacturing process

A technology of nano heat insulation and manufacturing process, which is applied in the field of building heat insulation film, and can solve the problems of increased energy consumption of air conditioners

Inactive Publication Date: 2019-09-20
苏州艾达仕电子科技有限公司
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Especially in summer, sunlight brings huge heat into the room through glass doors and windows, which significantly increases the energy consumption of air conditioners

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Wear-resistant nanometer thermal insulation film manufacturing process

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1~4

[0019] Embodiments 1 to 4: A manufacturing process for a wear-resistant nano-heat insulation film, the wear-resistant nano-heat insulation film includes a base material layer, an installation adhesive layer and a protective film layer, and the base material layer and the installation adhesive layer The opposite surface is coated with a wear-resistant layer, and there is a nano-heat insulation layer between the base material layer and the installation adhesive layer;

[0020] The nano heat insulation layer is obtained by coating and drying the nano heat insulation liquid, and the nano heat insulation liquid includes the following components in parts by weight:

[0021] Table 1

[0022] ;

Embodiment 1

[0023] The thickness of the substrate layer in Example 1 is 0.08 mm, the thickness of the mounting adhesive layer is 10 μm, and the substrate layer is a PET layer.

Embodiment 2

[0024] The thickness of the substrate layer in Example 2 is 0.06 mm, the thickness of the mounting adhesive layer is 5 μm, and the substrate layer is a PET layer.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a wear-resistant nanometer thermal insulation film manufacturing process, which comprises: mixing and stirring nanometer antimony-doped tin dioxide, nanometer dysprosium-doped tin dioxide, nanometer silicon nitride, ethyl 3-hydroxyoctanoate and ethyl acetate to form a mixed solution; stirring and mixing a polyurethane prepolymer and dihydroxy polyoxypropylene ether according to a certain mass part ratio under vacuum, and stirring while heating to a temperature of 40-50 DEG C; adding dimethyl adipate, p-hydroxybenzenesulfonic acid, 2-(2H-benzotriazole-2-yl)-6-dodecyl-4-cresol, a tertiary amine catalyst and the mixed solution, heating to a temperature of 50-80 DEG C, and continuously stirring for at least 30 min; and stirring while cooling to a room temperature to obtain the nanometer thermal insulation solution. According to the present invention, the nanometer ceramic efficient thermal insulation film can easily dissipate heat so as to reduce the indoor temperature, wherein the temperature can be reduced by 5-8 DEG C, and the infrared blocking rate can reach more than 95%.

Description

technical field [0001] The invention belongs to the technical field of building thermal insulation films, and in particular relates to a manufacturing process for wear-resistant nano thermal insulation films. Background technique [0002] Our country is in the heyday of construction, and nearly 2 billion square meters of houses are built every year, but only about 10% of the buildings can meet the national energy-saving standards; more than 95% of the existing buildings of about 40 billion square meters are high-energy It can be seen from energy-saving buildings that it is urgent to promote energy-saving buildings in our country. The most direct factor affecting building energy consumption is the thermal insulation and heat insulation performance of the building maintenance structure, and doors and windows are the weakest link. According to statistics, the energy consumption of door and window glass in buildings accounts for about 35% of the total energy consumption of buil...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B32B27/36B32B27/06B32B33/00C09D175/04C09D7/61C09D7/63
CPCB32B27/06B32B27/36B32B33/00B32B2255/26B32B2307/304C08K2201/011C09D7/61C09D7/63C09D175/04C08K3/34C08K3/22C08K5/3475C08K5/101
Inventor 叶旭东
Owner 苏州艾达仕电子科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com