Method for cyclic plating of hydrophobic membranes through plasma chemical vapor deposition

Abstract

The invention discloses a method for cyclic plating of hydrophobic membranes through plasma chemical vapor deposition. The method for cyclic plating of the hydrophobic membranes through plasma chemical vapor deposition comprises the following steps of (1) pretreatment is carried out, specifically, a to-be-coated surface is pretreated; (2) activation is carried out, specifically, the to-be-coated surface is activated in a reaction cavity by means of plasma gas; (3) membrane plating is carried out, specifically, a vaporized hydrophobic material enters the reaction cavity, and a hydrophobic membrane is formed by the hydrophobic material on the to-be-coated surface through plasma chemically-enhanced vapor deposition method; (4) feed of the hydrophobic material is stopped, step (2) and step (3)are carried out again, and another hydrophobic membrane is deposited on the original hydrophobic membrane; (5) step (4) is repeated; and (6) vacuum breaking is carried out in the reaction cavity, sothat a workpiece provided with multiple hydrophobic membranes is obtained. According to the method, the multiple hydrophobic membranes are deposited by means of cyclic plating, so that effective adhesion and close stacking of the membranes are facilitated, the quality of the membranes is improved, the membranes can adhere to and be deposited on the surface of the base material more firmly, and thedurability of the hydrophobic property is ensured.

Description

technical field [0001] The invention relates to the technical field of plasma chemically enhanced vapor deposition coating, in particular to a method for circulating a hydrophobic film by plasma chemical vapor deposition. Background technique [0002] In the plasma chemically enhanced vapor deposition coating process, especially in the hydrophobic film coating process, the collision reaction between the plasma gas carrier gas and the vaporized hydrophobic material is maintained for a period of time, and a layer of hydrophobic film is formed on the surface of the workpiece. According to the thickness requirements of the hydrophobic film, control The length of the reaction time. This coating process can form a single-layer hydrophobic film with a certain thickness, but the comprehensive performance of this single-layer hydrophobic film is not high enough, and there are problems of easy peeling and poor durability. [0003] At present, there are also records of plasma chemical...

AI Technical Summary

Problems solved by technology

This coating process can form a single-layer hydrophobic film with a certain thickness, but the comprehensive performance of this single-layer hydrophobic film is not high enough, and there are problems of easy falling off and poor durability.

[0003] At present, there are also records of plasma chemically enhanced vapor depositio

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