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Non-irritating moisturizing repair mask and preparation method thereof

A facial mask and moisturizing technology, applied in the directions of pharmaceutical formulations, cosmetic preparations, cosmetic preparations, etc., can solve the problems of inability to improve skin, discomfort, and prone to redness, itching, rash on the face, etc., to improve the moisturizing effect, Allergy reduction effect

Inactive Publication Date: 2019-04-23
广州达人研选生物科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But at present, when people use moisturizing and repairing facial masks, they are prone to allergic phenomena such as redness, itching, and rashes on the face, which can not only improve the skin, but also cause discomfort, which is far from meeting people's needs.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0116] The present invention also discloses a preparation method of the above-mentioned non-irritating moisturizing facial mask, which is characterized in that it comprises the following steps:

[0117] Phase A preparation steps: Weigh the dipropylene glycol of formula quantity, the glycerin of formula quantity, the allantoin of formula quantity, the betaine of formula quantity, the xanthan gum of formula quantity, the hydroxyethyl cellulose of formula quantity, formula Amount of EDTA-2Na, formulation amount of sodium hyaluronate, 3 / 5 formulation amount of 1.3-butanediol, and 9 / 10 formulation amount of pure water are mixed and heated to obtain phase A;

[0118] Production steps of Phase B: Mix 2 / 5 of the formulation amount of 1.3-butanediol, the formulation amount of p-hydroxyacetophenone, and the formulation amount of 1,2-hexanediol, and stir and heat to 60°C to make it Dissolve evenly to obtain phase B;

[0119] AB phase mixing step: Stir the A phase obtained in the A phase...

Embodiment 1

[0123] The non-irritating water replenishing and repairing facial mask of the present embodiment comprises the following compositions by weight percentage:

[0124] 1.3-Butanediol 5%

[0125] Glycerin 6%

[0126] Xanthan Gum 0.2%

[0127] Hydroxyethyl Cellulose 0.15%

[0128] EDTA-2Na 0.05%

[0129] Sodium Hyaluronate 0.08%

[0130] Palmitoyl Tetrapeptide-7 0.3%

[0131] Plant extracts 0.5%

[0132] 4-Hydroxyacetophenone 0.5%

[0133] Dipropylene Glycol 6%

[0134] Allantoin 0.1%

[0135] Betaine 2.5%

[0136] Sweet Cherry Fruit Extract 0.2%

[0137] Peppermint Extract 0.2%

[0138] Lavender Flower Water 3%

[0139] 1,2-Hexanediol 0.5%

[0140] Pure water balance (that is, 74.72%).

[0141] Wherein, the plant extracts include licorice root extract, green tea extract, rosemary leaf extract, centella asiatica extract, chamomile flower extract, scutellaria baicalensis root extract, and knotweed root extract.

[0142] As the optimal solution of the present invention...

Embodiment 2

[0149] The non-irritating water replenishing and repairing facial mask of the present embodiment comprises the following compositions by weight percentage:

[0150] 1.3-Butanediol 3%

[0151] Glycerin 1%

[0152] Xanthan Gum 0.2%

[0153] Hydroxyethyl Cellulose 0.05%

[0154] EDTA-2Na 0.01%

[0155] Sodium Hyaluronate 0.02%

[0156] Palmitoyl Tetrapeptide-7 0.2%

[0157] Plant extracts 0.2%

[0158] 4-Hydroxyacetophenone 0.3%

[0159]Dipropylene Glycol 2%

[0160] Allantoin 0.2%

[0161] Betaine 2%

[0162] Sweet cherry fruit extract 0.1%

[0163] Peppermint Extract 0.1%

[0164] Lavender Flower Water 2%

[0165] 1,2-Hexanediol 0.2%

[0166] Pure water balance (that is, 88.42%).

[0167] Wherein, the plant extracts include licorice root extract, green tea extract, rosemary leaf extract, centella asiatica extract, chamomile flower extract, scutellaria baicalensis root extract, and knotweed root extract.

[0168] The preparation method of the non-irritating moistu...

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Abstract

The invention discloses a non-irritating moisturizing repair mask and a preparation method thereof. The non-irritating moisturizing repair mask is prepared from 1,3-butanediol, glycerin, xanthan gum,hydroxyethyl cellulose, EDTA-2Na, sodium hyaluronate, palmitoyl tetrapeptide-7, plant extracts, p-hydroxyacetophenone, dipropylene glycol, allantoin, betaine, an European sweet cherry fruit extract, apeppermint extract, lavender flower water, 1,2-hexanediol and pure water; the plant extracts comprise the glycyrrhiza glabra root extract, the green tea extract, the rosemary leaf extract, the herbacentellae extract, the chamomilla recutita flower extract, the scutellaria root extract and the polygonum cuspidatum root extract. The non-irritating moisturizing repair mask can moisturize and repairthe skin; moreover, the components of the mask adopt the third EWG grade and below, the mask is natural and free of irritation, the safety is higher, the burden on the skin is not increased, and theenvironment is not polluted.

Description

technical field [0001] The invention relates to a non-irritating water replenishing and repairing facial mask and a preparation method thereof. Background technique [0002] As one of the commonly used facial masks, the moisturizing and repairing facial mask mainly plays the role of replenishing moisture to the skin and repairing the skin barrier, so it is favored by people. But at present, when people use moisturizing and repairing facial masks, they are prone to allergic phenomena such as redness, itching, and rashes on the face, which will not only fail to improve the skin, but also cause discomfort, which is far from meeting people's needs. Contents of the invention [0003] In order to overcome the deficiencies of the prior art, one of the objectives of the present invention is to provide a non-irritating moisturizing and repairing facial mask, which can replenish and repair the skin and reduce allergies. [0004] The second object of the present invention is to prov...

Claims

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Application Information

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IPC IPC(8): A61K8/9789A61K8/73A61Q19/00
CPCA61K8/735A61K2800/592A61K2800/5922A61Q19/00A61K8/9789
Inventor 杨延辉
Owner 广州达人研选生物科技有限公司
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