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Preparation method of double-layer chiral structure

A chiral structure, double-layer technology, applied in optical components, instruments, optics, etc., can solve the complicated and complicated problems of double-layer chiral metal micro-nano structures, achieve the effect of simple and easy to operate in the preparation process, and avoid operational errors

Active Publication Date: 2019-03-19
JILIN UNIV FIRST HOSPITAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In order to solve the cumbersome and complicated problem of the double-layer chiral metal micro-nano structure existing in the prior art, the present invention provides a preparation method of the double-layer chiral structure, which can realize the double-layer chiral structure through one-time exposure and coating. The preparation of metal structures, moreover, the preparation precision is high

Method used

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  • Preparation method of double-layer chiral structure
  • Preparation method of double-layer chiral structure
  • Preparation method of double-layer chiral structure

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Embodiment 1

[0037] A method for preparing a double-layer chiral structure, comprising the following steps:

[0038] Step 1: Prepare the glass substrate 100, prepare the ITO glass substrate 100 and clean it for use;

[0039] in particular:

[0040] Prepare an ITO glass substrate 100 with a thickness of 1.0mm and a length and width of 20.0mm*20.0mm, and put the prepared ITO glass into a washing solution to clean it. After ultrasonication with deionized water for 15 minutes, ultrasonication with acetone for 15 minutes, and alcohol Sonicate for 15 minutes, then use deionized water to sonicate for 5 minutes, and finally dry it with a nitrogen gun and put it in a nitrogen cabinet for later use.

[0041] Step 2: Coating photoresist on the substrate 100, and throwing two photoresist layers on the surface of the substrate 100 with a glue-spinning machine;

[0042] in particular:

[0043] The specific steps of removing glue are as follows: on the prepared glass substrate 100, use a glue removing...

Embodiment 2

[0057] For the double-layer chiral structure prepared in this embodiment, only the thickness of the metal material 103 vertically evaporated by the electron beam evaporation coating apparatus is changed, and the preparation process is the same as that in Embodiment 1.

[0058] in particular:

[0059] When using the electron beam vacuum evaporation coating instrument to vertically evaporate the metal material 103, the thickness of the evaporated metal material 103 is controlled, and the thickness of the electron beam evaporation coating instrument to vertically evaporate the metal material 103 is less than the thickness of the positive glue 101, such as Figure 8 shown. After the coating is evaporated, the photoresist stripping process is performed, and the substrate 100 is soaked with a negative stripping solution to dissolve the negative glue 102, and the soaking time is at least 30 minutes. like Figure 9 As shown, after the negative resist 102 is removed, the metal materi...

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Abstract

The invention relates to the field of preparation of micro-nano structures, in particular to a preparation method of a double-layer chiral structure. The preparation method comprises the main steps ofpreparation of a glass substrate, whirl coating, exposure, developing and fixation, evaporation of a metallic material and stripping of a photoresist. The preparation method of the double-layer chiral structure has the advantages that one-time exposure is only needed, evaporation is carried out once to obtain the double-layer structure, and the interval between upper and lower layers can also beadjusted during evaporation. The preparation method of the double-layer chiral structure has the advantages that the preparation method is simple, convenient and easy to operate, and the accuracy of the prepared double-layer structure is high.

Description

technical field [0001] The invention belongs to the field of metal micro-nano structure preparation, and in particular relates to a preparation method of a double-layer chiral structure. Background technique [0002] Chirality refers to the property that the structure is not completely superimposable with its mirror image counterpart. Chirality is the basic characteristic of life process. Most of the organic molecules that make up living organisms are chiral molecules. Circular dichroism is a method to detect chiral structure. The circular dichroism of chiral molecules in nature is very weak, which is not conducive to the actual signal detection in biomedicine and pharmacology. The artificial chiral metal micro-nanostructure has stronger circular dichroism due to its interaction with left-handed circularly polarized light and right-handed circularly polarized light to generate different surface plasmon resonance modes. Artificial chiral metal nanostructures have broad appl...

Claims

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Application Information

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IPC IPC(8): G02B5/00
CPCG02B5/008
Inventor 刘凯王天堃
Owner JILIN UNIV FIRST HOSPITAL
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