Rotary Tray Fixture

Abstract

The invention discloses a rotary tray fixed device. The rotary tray fixed device comprises a rotating shaft, a supporting claw and grooves, wherein the supporting claw is fixed to the rotating shaft and comprises an axis body and n claw arms; n is greater than or equal to 3; each claw arm is connected to the axis body; a boss is arranged at the tail end of each claw arm and realizes the placementof a tray to be placed in the supporting claw and the limitation of the tray in a plane direction of the tray; the boss at the tail end of each claw arm is correspondingly provided with a pressing block; the pressing block realizes the placement of the tray to be placed in the supporting claw and the limitation of the tray in a direction perpendicular to the plane of the tray; the pressing blocksand the bosses realize the stable fixation of the tray; and the grooves are formed in the claw arms of the supporting claw. The rotary tray fixed device realizes the firmness of the tray in a rotary process, is also conductive to reducing the influence of the inertia on the rotation and can increase the utilization rate of energy.

Description

technical field [0001] The disclosure belongs to the field of thin film material growth equipment manufacturing, and relates to a rotating tray fixing device. Background technique [0002] The growth of thin film materials is an important process step in the fields of semiconductor technology, microelectronics, etc., especially in the epitaxial growth of semiconductor materials, the growth technology of thin film materials is very critical to the performance of semiconductor devices. Metal-organic Chemical Vapor Deposition (MOCVD, Metal-organic Chemical Vapor Deposition) is a commonly used semiconductor thin film material growth equipment, especially suitable for large-scale production in the semiconductor industry. The most important equipment for compound semiconductors such as gallium oxide and zinc oxide. [0003] Metal-organic chemical vapor deposition uses organic compounds of group III and group II elements in the periodic table of elements and hydrides of group V an...

AI Technical Summary

Problems solved by technology

[0004] In the process of material growth, in order to optimize the growth, the tray is usually set to rotate and heat. Rotation brings problems such as airflow vortex, which will cause the tray to be affected by the airflow and appear unstable. Heating may cause some problems in the tray. The force causes the pallet to shake

During the growth process, the tray will rotate at high speed. If the tray is not stable when the tray is rotating at a high speed, it will easily cause the tray to overturn, resulting in the rupture of the substrate and even the damage of the reaction chamber.

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