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A washing and absorbing device for preparing electronic-grade hydrogen fluoride

An absorption device, hydrogen fluoride technology, applied in the separation of dispersed particles, chemical instruments and methods, separation methods, etc., can solve problems such as safety accidents, non-compliance with technical specifications, increased difficulty and cost of treatment, etc.

Active Publication Date: 2019-01-15
三立福新材料(福建)有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] Prior art 1 uses fluorine gas as an oxidant to oxidize impurities in hydrogen fluoride, and removes high boiling substances such as HAsF by washing and rectifying methods 6 , MAsF 6 、H 2 SO 4 、H 2 O, H 2 SiF 6 、H 3 PO 4 etc. and volatile component SO 2 、SiF 4 、PF 3 、POF 3 , AsF 5 , SF 6 、PF 5 etc., the problems still to be solved are, first, fluorine gas is highly toxic, highly chemically active and strong oxidizing, and it is difficult to solve the sealing problem of existing conveying machinery such as circulating pumps, and serious safety accidents are likely to occur if leakage occurs; , the integration of rectification and washing in a rectification tower does not meet the technical specifications; prior art 2 points out that the impurity arsenic in hydrogen fluoride has a serious impact on the performance of electronic devices, and the removal of arsenic is a key technology for the purification of hydrogen fluoride. The method commonly used in the prior art is to use an oxidant to oxidize trivalent arsenic to a high-boiling point pentavalent arsenic compound, and then use distillation to remove it. The oxidant is usually potassium permanganate, hydrogen peroxide, potassium dichromate, etc. The problems to be solved are: first, the introduction of other impurities increases the difficulty and cost of subsequent treatment; second, the oxidation time is longer, generally reaching 6 to 48 hours, and the energy consumption is higher

Method used

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  • A washing and absorbing device for preparing electronic-grade hydrogen fluoride
  • A washing and absorbing device for preparing electronic-grade hydrogen fluoride
  • A washing and absorbing device for preparing electronic-grade hydrogen fluoride

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Embodiment Construction

[0020] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0021] like figure 1 , figure 2 , image 3 As shown, a washing and absorbing device for preparing electronic-grade hydrogen fluoride is characterized in that it includes a washing and absorbing tower 1, a circulating storage tank 2, a circulating pump assembly 3, a condensation tower 4, the bottom of the washing and absorbing tower 1, the condensing tower 4 and the circulating storage The slots 2 communicate to form a U-shaped connector.

[0022] The washing and absorbing tower 1 includes a liquid collecting pipe 5, a washing and absorbing tower body 6, an air inlet duct 7, a packing 8, a liquid distribution grid 9, a spray pipe fitting 10, and an exhaust duct 11. The condensation tower 4 includes an exhaust gas inlet 12. Condensing tower body 13, condensing tube plate 14, liquid removal device 15, tail gas discharge port 16, condensate out...

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Abstract

The invention relates to the technical field of fluorine chemical engineering and particularly relates to a washing and absorbing device for preparing electronic-grade hydrogen fluoride. The device ischaracterized by including a washing and absorbing column, a circulating storage tank, a circulating pump assembly and a condensation column. The bottoms of the washing and absorbing column and the condensation column communicate with the circulation storage tank to form a U-shaped communicating vessel.

Description

technical field [0001] The invention relates to the technical field of fluorine chemical industry, in particular to a washing and absorbing device for preparing electronic-grade hydrogen fluoride. Background technique [0002] Electronic-grade hydrogen fluoride is mainly used as a cleaning agent and etchant in photovoltaics, integrated circuits and other industries. It is one of the key auxiliary materials in these industries. Since the impurity arsenic has a serious impact on the performance of electronic devices, the removal of arsenic is a must for the purification of hydrogen fluoride. The key technology is to use an oxidant to oxidize trivalent arsenic to a high-boiling pentavalent arsenic compound, and then use the difference in volatility to distill it out. Chinese invention patent (patent number CN201110276860.4, patent name is a method for preparing electronic grade hydrofluoric acid) discloses a method for preparing electronic grade hydrofluoric acid, including the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D53/18B01D53/14B01D53/00
CPCB01D53/002B01D53/1412B01D53/1456B01D53/18B01D2252/103
Inventor 杨松
Owner 三立福新材料(福建)有限公司
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