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A kind of vanadium dioxide multilayer film system and its preparation method and application

A vanadium dioxide and multi-layer film technology, applied in the field of physics, can solve the problems affecting the phase transition performance of thin-film materials and the large differences in physical properties, and achieve the goal of reducing the probability of defect generation, reducing the number of layers, and simplifying the multi-layer film system structure. Effect

Active Publication Date: 2021-01-15
SHENZHEN UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in the multilayer film system of the existing vanadium dioxide multilayer film element, due to the large variety of vanadium oxides and their properties and growth conditions are close to each other, the vanadium dioxide film actually prepared by the researchers (that is, vanadium dioxide Multilayer film) is a thin film material mainly composed of vanadium dioxide and accompanied by a small amount of other impurity phases such as V 2 o 5 、VO 2 , V 2 o 3 , VO and other 13 different phases, and there are V n o 2n-1 (3≤n≤9) and V n o 2n+1 (3≤n≤6) intermediate phase, the phase lattice structure of vanadium in different valence states is different, and the lattice structure, electrical, optical and other physical properties of each phase are quite different, which greatly affects the final film material phase change properties

Method used

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  • A kind of vanadium dioxide multilayer film system and its preparation method and application
  • A kind of vanadium dioxide multilayer film system and its preparation method and application

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Embodiment 1

[0055] This embodiment provides a vanadium dioxide multilayer film element, which includes a vanadium dioxide multilayer film system and an element substrate carrying the vanadium dioxide multilayer film system.

[0056] The specific steps of the preparation method of the vanadium dioxide multilayer film element are as follows:

[0057] Step 1. Theoretical design and optimization of the spectral performance of the vanadium dioxide multilayer film system

[0058] Using the existing film system analysis software, respectively analyze the influence trend and change rule of the sputtering process parameters on the performance of the graded refractive index material and the performance of the vanadium dioxide film, so as to evaluate the tolerance of the process preparation; The required gradient refractive index material film layer refractive index distribution prepared by the process; on this basis, the vanadium dioxide multilayer film system has a large spectral bandwidth range a...

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Abstract

The invention belongs to the field of physics and particularly relates to a vanadium dioxide multilayer membrane system and a preparation method and application thereof. The vanadium dioxide multilayer membrane system comprises a metal thin membrane layer, a gradient refraction index material thin membrane layer and a vanadium dioxide thin membrane layer which are arranged from bottom to top in sequence. A vanadium dioxide material with a gradient refraction index function is used for the vanadium dioxide multilayer membrane system, so that the membrane layer number required in the vanadium dioxide multilayer membrane system is greatly reduced.

Description

technical field [0001] The invention belongs to the field of physics, and in particular relates to a vanadium dioxide multilayer film system and a preparation method and application thereof. Background technique [0002] With the vigorous development of my country's aerospace industry, the number of spacecraft such as various deep space probes, artificial satellites, space laboratories, and space telescopes has increased year by year. Due to the complexity of the internal equipment of the spacecraft, the power consumption and heat flux of the instrument continue to increase, and at the same time, the changes in the space environment faced by the spacecraft are becoming more and more complex. In general, the external temperature of the spacecraft fluctuates in the range of 150°C to 150°C, and in special environments it can reach 100°C to 400°C. Therefore, the importance of research on heat flow control of spacecraft for the development of aerospace technology is self-evident...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01G31/02C23C14/34C23C14/54
CPCC01G31/02C23C14/34C23C14/54
Inventor 靳京城张东平范平杨宇黄莹管欢秦晓楠关天锐
Owner SHENZHEN UNIV
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