Etching solution formula of molybdenum grid product
A production method and etching solution technology are applied in the field of etching solution formulations for molybdenum gate products, which can solve the problems of easily changing concentration, unstable etching solution, and difficulty in controlling dosage, etc., and achieve the effect of stable physical and chemical properties.
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Embodiment 1
[0018] A kind of etchant formula of molybdenum gate product, comprises following components:
[0019] 100 liters of ionized water;
[0020] 50 liters of sulfuric acid with a concentration of 98%;
[0022] Thiourea 15 grams.
[0023] The method for the production etchant of above-mentioned etchant formulation,
[0024] 1) Measure 100 liters of ion water and pour it into a 10mm thick plastic ion water tank;
[0025] 2) Add 50 liters of sulfuric acid to the ion water tank in batches, the sulfuric acid concentration is 98% and stir, and control the temperature within 65°;
[0026] 3) When the temperature is within 40°, add 10kg of sodium nitrate and 15g of thiourea and fully dissolve;
[0027] 4) Measure the Baume degree, and the Baume degree of the dissolved solution is 42 to obtain the etching solution.
Embodiment 2
[0029] A kind of etchant formula of molybdenum gate product, comprises following components:
[0030] 100 liters of ionized water;
[0031] 60 liters of sulfuric acid with a concentration of 98%;
[0032] Sodium nitrate 20 kg;
[0033] Thiourea 20 grams.
[0034] The specific processing and production method is with reference to embodiment one.
Embodiment 3
[0036] A kind of etchant formula of molybdenum gate product, comprises following components:
[0037] 100 liters of ionized water;
[0038] 53 liters of sulfuric acid with a concentration of 95%;
[0039] Sodium nitrate 13 kg;
[0040] Thiourea 15 grams.
[0041] The specific processing and production method is with reference to embodiment one.
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