Exposure pattern compensation method, exposure pattern compensation device and exposure equipment

Abstract

The invention provides an exposure pattern compensation method, an exposure pattern compensationdevice and exposure equipment, and relates to the field of display panel manufacturing. The method, thedevice and the equipment are used for solving the problem of high cost during the TP deign value and practical value difference reduction of the color film base plate exposure pattern in a mask platereplacing mode in the prior art. The compensation method comprises the following steps of compensating the original design coordinate of a work table relative to a mask plate according to at least onefirst measurement dimension, corresponding second measurement dimension, the corresponding design dimension and the threshold value work coefficient, so that the compensation design coordinate of thework table relative to the mask plate can be obtained; controlling the movement of the work table relative to the mask plate according to the compensation design coordinate. The first measuring dimension is the exposure pattern dimension measured after the formation of the exposure pattern; the second measurement dimension is the dimension of the exposure pattern measured after the formation of other patterns on the substrate base plate; the design dimension is the design dimension of the exposure pattern.

Description

technical field [0001] The invention relates to the field of display panel production, in particular to a method and device for correcting an exposure pattern, and exposure equipment. Background technique [0002] In the TFT-LCD manufacturing process, both TN (Twisted Nematic Mode, twisted nematic) and ADS (Advanced-Super Dimension Switch Mode, advanced super-dimensional field switch) products have Touch Mura (applying a certain amount on the surface of the finished module. External force, white and bright phenomenon appears on the dark screen) problem. Since the formation principle of Touch Mura is relatively complicated and there are many influencing factors, this defect has always been a difficult problem in the industry. According to the research on the mechanism of Touch Mura, its influencing factors are generally summarized into the following two types: [0003] figure 1 It is a structural diagram of a TN mode liquid crystal panel, which is mainly because the surfac...

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Problems solved by technology

[0006] Embodiments of the present invention provide a method and device for correcting exposure patterns, and exposure equipment, which are used to avoid the high cost of reducing the difference between the TP design value and the actual value of the exposure pattern of the color filter substrate by replacing the mask plate. high problem

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