A method for improving the self-discharge of supercapacitors

A supercapacitor and self-discharge technology, which is applied in the field of electrochemistry, can solve problems such as complicated process, hindering the promotion of supercapacitors, and poor stability of supercapacitors, and achieves the effect of low energy consumption and improved self-discharge performance

Active Publication Date: 2019-12-13
柔电(武汉)科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0020] Self-discharge is a key indicator that determines the performance of supercapacitors. Compared with chemical energy storage, the characteristic of large self-discharge greatly hinders the further promotion of supercapacitor market applications. Therefore, improving the self-discharge of supercapacitors is an urgent need for us to solve Traditional methods for improving supercapacitors mainly start with raw materials and production processes, including pore structure control and surface functional group treatment of activated carbon, control of diaphragm thickness and pore size, and optimization of drying and aging processes; However, these methods for improving supercapacitors are not only complicated, but also have poor stability during use.

Method used

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  • A method for improving the self-discharge of supercapacitors
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  • A method for improving the self-discharge of supercapacitors

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Embodiment 1

[0058] Embodiment 1 of the present invention provides a method for improving the self-discharge of a supercapacitor, the method comprising the following steps:

[0059] 1) Put the activated carbon electrode as the substrate into the vacuum reaction chamber of the atomic layer deposition equipment;

[0060] 2) Introduce trimethylaluminum vapor into the vacuum reaction chamber, and the trimethylaluminum vapor reacts with the surface functional groups of the activated carbon electrode; the surface functional groups of the activated carbon electrode include carboxyl, carboxylic anhydride, lactone, phenol, Quinone group, ether group and carbonyl group; taking -COOH as an example, the participating reactions can be divided into the following two steps:

[0061]

[0062] 3) Use high-purity argon to flush the unreacted trimethylaluminum vapor and the by-products produced by the reaction;

[0063] 4) With trimethylaluminum as the aluminum source, with H 2 O is an oxygen source, an...

Embodiment 2

[0073] Embodiment 2 of the present invention provides a method for improving the self-discharge of a supercapacitor, the method comprising the following steps:

[0074] 1) Put the activated carbon electrode as the substrate into the vacuum reaction chamber of the atomic layer deposition equipment;

[0075] 2) Pass TiCl into the vacuum reaction chamber 4 Vapor, TiCl 4 The vapor reacts with the surface functional groups of the activated carbon electrode;

[0076] 3) Flush the unreacted TiCl with high-purity argon 4 Vapor and reaction by-products;

[0077] 4) with TiCl 4 as titanium source, with H 2 O is the oxygen source, and the following cycle reaction is carried out: feed TiCl 4 Vapor, for atomic layer deposition; flush unreacted TiCl with high-purity Ar gas 4 And the by-products produced by the reaction; water vapor, water vapor and TiCl 4 Molecules of the vapor react to form TiO 2 Thin film; use high-purity Ar gas to flush the water vapor that has not participated ...

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Abstract

The invention belongs to the technical field of electrochemistry, and in particular relates to a method for improving self discharge of a super capacitor. The method comprises the following steps: 1)putting an activated carbon electrode as a substrate in a vacuum reaction chamber; 2) introducing first precursor gas into the vacuum reaction chamber, wherein the first precursor gas is reacted witha surface functional group of the activated carbon electrode; 3) flushing the electrode with inert gas; and 4) introducing the first precursor gas as a metal source and the second precursor gas as anoxygen source into the vacuum reaction chamber and carrying out atomic layer deposition circulation in an inert gas atmosphere till forming a metal oxide film with a targeted thickness. The metal oxide is deposited to the surface of the activated carbon electrode to form a coating layer by means of the atomic layer deposition technology, so that the surface structure of the carbon electrode is improved, and the stability of the super capacitor in the using process is enhanced; and the purpose of simply and precisely controlling the thickness needed by growth of a film can be achieved by controlling the periodicity of the reaction.

Description

technical field [0001] The invention belongs to the technical field of electrochemistry, and in particular relates to a method for improving the self-discharge of a supercapacitor. Background technique [0002] With the expansion of the field of use of supercapacitors, some of its own shortcomings have also been exposed to the public. The first one is self-discharge, which has a major impact on the energy storage capacity and cycle stability of supercapacitors. When the supercapacitor is independent of the external circuit, the self-discharge is caused by the parasitic current passing through one of the positive and negative electrodes or a pair of independent electrodes, which can be mainly attributed to the following reasons: [0003] 1) When the electrode / electrolyte surface voltage is higher than the electrolyte decomposition voltage, a redox reaction will occur, which will generate a self-discharge caused by a voltage-controlled Faraday impedance, which is proportional ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01G11/84H01G11/86H01G11/30H01G11/32H01G11/46C23C16/40C23C16/455
CPCC23C16/40C23C16/45553H01G11/30H01G11/32H01G11/46H01G11/84H01G11/86Y02E60/13
Inventor 于圣明胡韬解明
Owner 柔电(武汉)科技有限公司
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