Touch screen laser splicing pattern structure and its etching wiring method

An etching line, touch screen technology, applied in instruments, computing, electrical and digital data processing, etc., can solve the problems of limited distance and short circuit of laser once, avoid splicing deviation, ensure splicing accuracy, and save etching wiring time.

Active Publication Date: 2021-10-26
ZHANGJIAGANG KANGDE XIN OPTRONICS MATERIAL
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The ITO pattern unit in the touch screen adopts the laser process, but the distance of the laser once is limited and needs to be spliced, so it is impossible to realize such Figure 1C Ideal etched wire routing
There is a problem of splicing deviation in the direct splicing of oblique lines and oblique lines by laser machines, which will cause local short circuits

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Touch screen laser splicing pattern structure and its etching wiring method
  • Touch screen laser splicing pattern structure and its etching wiring method
  • Touch screen laser splicing pattern structure and its etching wiring method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] Such as image 3 with Figure 4 As shown, this embodiment relates to a touch screen laser splicing pattern structure, including a first etching line 1 and a second etching line 2 adjacent to it, and the first etching line 1 and the second etching line 2 pass through the first right angle at the splicing point The bending structure is connected; the first right-angle bending structure is a first open rectangle 5, including two parallel etching lines and an etching line perpendicular to and connected to the two parallel etching lines;

[0032] The extension of the first etching line 1 and the second etching line 2 intersects at an intersection angle α.

[0033] This embodiment also includes a third etching line 3 and a fourth etching line 4 adjacent to it, the third etching line 3 and the fourth etching line 4 are connected by a second right-angle bending structure at the joint; the second right-angle The bent structure is a second open rectangle 6, including two parall...

Embodiment 2

[0040] Such as Figure 5 As shown, this embodiment relates to a touch screen laser splicing pattern structure, including a first etching line 1 and a second etching line 2 adjacent to it, and the first etching line 1 and the second etching line 2 pass through the first right angle at the splicing point The bending structure is connected; the first right-angle bending structure is a first open rectangle 5, including two parallel etching lines and an etching line perpendicular to and connected to the two parallel etching lines;

[0041] The extension of the first etching line 1 and the second etching line 2 intersects at an intersection angle α.

[0042] This embodiment also includes a third etching line 3 and a fourth etching line 4 adjacent to it, the third etching line 3 and the fourth etching line 4 are connected by a second right-angle bending structure at the joint; the second right-angle The bent structure is a second open rectangle 6, including two parallel etching line...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
lengthaaaaaaaaaa
Login to view more

Abstract

A touch screen laser splicing pattern structure and its etching wiring method in the field of touch screen technology, a first etching line and an adjacent second etching line are connected through a first right-angle bending structure at the splicing place; the first etching line and the The extension lines of the second etching lines intersect at an angle of α. The present invention adds a right-angle transitional splicing structure at the splicing part of the diagonal line, which can ensure the splicing accuracy of the diagonal line segment and avoid short circuit caused by splicing deviation.

Description

technical field [0001] The invention relates to a technology in the field of touch screens, in particular to a touch screen laser splicing pattern structure and an etching wiring method thereof. Background technique [0002] Such as Figure 1A with 1B Shown are the laser pattern structure diagrams of the ITO upper film and lower film in the touch screen, respectively. The ITO pattern unit in the touch screen adopts the laser process, but the distance of the laser once is limited and needs to be spliced, so it is impossible to realize such Figure 1C Ideal for etched wire routing. There is a problem of splicing deviation in the direct splicing of oblique lines and oblique lines by laser machines, and this splicing deviation will cause local short circuits. At present, most of the ITO pattern units adopt a rhombus structure, which inevitably needs to be spliced ​​with oblique lines, such as figure 2 shown. Contents of the invention [0003] Aiming at the above-mentione...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G06F3/041
CPCG06F3/041G06F2203/04103
Inventor 李文李兆勇任小勇
Owner ZHANGJIAGANG KANGDE XIN OPTRONICS MATERIAL
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products