Plasma height adjusting apparatus and method

A plasma and height adjustment technology, applied in material excitation analysis, thermal excitation analysis, etc., can solve the problems of complex mechanical design, hidden dangers of microwave radiation, wear, etc., to avoid mechanical loss, simple and compact structure, and improve the effect of safety factor

Inactive Publication Date: 2018-05-04
中控全世科技(杭州)有限公司
View PDF4 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0015] The lifting operating system of the existing spectrometer generally adopts a mechanical type, that is, the probe (optical fiber or light tube, etc.) of the whole microwave plasma torch or optical detector is moved up and down by manual or automatic facilities, and its defects have the following points: a. It is necessary to provide additional space for mechanical installation and movement, which is not conducive to the miniaturization of the structure; b. Mechanical movement will bring wear and other factors that affect the accuracy and reproducibility of the experiment; c. Mechanical movement will also cause safety hazards; d. . Mechanical movement will reduce the detection efficiency of the spectrometer; e. The mechanical design is complex, and the required activity space brings hidden dangers to microwave radiation

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Plasma height adjusting apparatus and method
  • Plasma height adjusting apparatus and method
  • Plasma height adjusting apparatus and method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0042] In order to make the object, technical solution and advantages of the present invention clearer, various embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0043] Such as figure 1 Shown, a kind of plasma height adjusting device comprises MPT module (dotted frame part), optical fiber probe, optical system, camera, detection terminal, control board and exhaust module, and described MPT module is plasma torch; The exhaust module is used to exhaust the chamber of the plasma torch; the optical fiber probe is used to obtain the optical signal generated by the plasma; the optical system is connected to the optical fiber probe for The optical signal from the probe generates a spectrogram; the camera is used to take images of the plasma; the detection terminal is used to control the exhaust speed of the exhaust module through the control board, according to the output generated by the optical system The spectr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a plasma height adjusting apparatus and method. The apparatus comprises an MPT(microwave plasma torch) module, an optical fiber probe, an optical system, a camera, a detectionterminal, a control panel and an exhaust module, wherein the MPT module is a plasma torch tube; the exhaust module is used for exhausting a chamber of the plasma torch tube; the optical fiber probe isused for acquiring an optical signal generated by plasma; the optical system is connected with the optical fiber probe and used for generating a spectrogram according to the optical signal transferred from the optical fiber probe; the camera is used for photographing a plasma image; and the detection terminal is used for controlling an exhaust velocity of the exhaust module by virtue of the control panel, calculating a signal-to-background ratio according to the spectrogram generated by the optical system and identifying the plasma image photographed by the camera so as to obtain a plasma height. According to the plasma height adjusting apparatus and method, the concentration of plasma gas is changed by virtue of exhaustion, and then the plasma height is further indirectly changed, so that an actual imaging point is disposed in an optimum observation interval of plasma, thereby improving the detection precision.

Description

technical field [0001] The invention belongs to the field of atomic emission spectrometers, and in particular relates to a plasma height adjustment device and method. Background technique [0002] Side view observation mode: the observation mode in which the central axis of the plasma torch is at right angles to the optical axis of the detection system; [0003] End-view observation mode: the observation mode in which the central axis of the plasma torch coincides with or is parallel to the optical axis of the detection system; [0004] Plasma gas: the main atmosphere used to form and maintain plasma, such as Ar, etc.; [0005] Plasma torch: a device used to form and maintain plasma, such as microwave plasma torch (MPT), inductively coupled plasma torch (ICP), surface wave device (Surfatron), etc. [0006] In the plasma atomic emission spectrometer, the sample to be measured is usually introduced into the plasma by the carrier gas in gaseous form, and undergoes evaporation...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/73
CPCG01N21/73
Inventor 郑磊落郭淳陈挺楼屹赖晓健
Owner 中控全世科技(杭州)有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products