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High-precision vacuum gauge tube

A vacuum gauge and high-precision technology, applied in the direction of particle separation tube, ion diffusion discharge tube, etc., can solve the problems of measurement error and achieve the effect of accurate measurement and small thermal drift coefficient

Inactive Publication Date: 2018-03-27
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Since the measurement accuracy is changed by the stress of the film, when the temperature changes, the expansion coefficient of the film and the shell is different, which will cause measurement errors

Method used

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  • High-precision vacuum gauge tube

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Embodiment Construction

[0025] In order to better understand the above-mentioned technical solution, the above-mentioned technical solution will be described in detail below in conjunction with the accompanying drawings and specific implementation methods.

[0026] Such as figure 1 As shown, the embodiment of the present invention provides a high-precision vacuum gauge, including: a housing, a diaphragm 11, a fixed electrode 6, a first electrode post 3, a second electrode post 2, and an air inlet 9, wherein the diaphragm 11 and The fixed electrode 6 forms a variable capacitor. The shell includes an upper cover shell 1 and a lower cover shell 8, the upper cover shell 1 and the lower cover shell 8 are welded together, and the material of the shell is Hastelloy. The film sheet 11 is fixedly arranged inside the housing, and the internal space of the housing is divided into a vacuum space and a measured space; the material of the film sheet 11 is Hastelloy, and the thickness of the film sheet 11 is 30 M...

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Abstract

The invention relates to the manufacturing technical field of a semiconductor, and specifically relates to a high-precision vacuum gauge tube. The high-precision vacuum gauge tube comprises a shell, athin film sheet, a fixed electrode, a first electrode column, a second electrode column and an air inlet, wherein the thin film sheet is fixedly arranged in the shell for dividing the internal spaceof the shell into a vacuum space and a tested space; the fixed electrode is fixedly arranged in the vacuum space; a main electrode is arranged on the surface, opposite to the thin film sheet, of the fixed electrode; a gold-plated layer is arranged on the other surface of the fixed electrode; one end of the first electrode column is connected with an external capacitance measurement circuit while the other end is connected with the shell; one end of the second electrode column is connected with the external capacitance measurement circuit while the other end passes through the shell to be connected with the gold-plated layer and insulated from the shell; and the air inlet is formed in the shell and positioned on one side of the tested space. The high-precision vacuum gauge tube is accuratein measurement and low in thermal drift coefficient and can be applicable to vacuum measurement in the semiconductor process equipment.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a high-precision vacuum gauge. Background technique [0002] Many process steps in the field of semiconductor manufacturing need to be carried out under high vacuum. Film-type full-capacitance vacuum gauges are widely used in semiconductor equipment to measure vacuum. Thin-film vacuum gauges mainly rely on the deformation of the movable film on both sides of the atmospheric pressure difference to produce a change in capacitance. Since the measurement accuracy is changed by the stress of the film, when the temperature changes, the expansion coefficients of the film and the shell are different, which will cause errors in the measurement. Contents of the invention [0003] The object of the present invention is to provide a high-precision vacuum gauge, which has accurate measurement and is suitable for vacuum measurement in semiconductor process equipment. ...

Claims

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Application Information

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IPC IPC(8): H01J41/12
CPCH01J41/12
Inventor 康恒景玉鹏黄洛俊
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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