High-frequency line
A high-frequency, line technology, applied in the field of high-frequency lines, to achieve the effect of suppressing impedance changes
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no. 1 approach
[0054] exist Figure 4A A plan view of the segment unit of the high-frequency line according to the first embodiment of the present invention is shown in Figure 4B Its IVB-IVB sectional view is shown in Figure 4C Its IVC-IVC transverse cross-sectional view is shown in Figure 4D Its IVD-IVD transverse cross-sectional view is shown in . The high-frequency line of the present embodiment is a microstrip line, and its basic structure is formed by laminating a ground electrode 302 , a dielectric layer 304 , and a signal electrode 305 in this order on an SI-InP substrate 301 . In addition, as shown in the lateral cross-sectional view, the optical waveguide cores 303 of InP-based semiconductors intersect in a state of crossing the high-frequency line 305 .
[0055] like Figure 4B sectional view, Figure 4D As shown in the transverse cross-sectional view of the optical waveguide, the ground electrode 302 of the high-frequency line is partially interrupted along the transmissio...
no. 2 approach
[0062] exist Figure 7A A plan view of the segment unit of the high-frequency line according to the second embodiment of the present invention is shown in Figure 7B Its VIIB-VIIB cross-sectional view is shown in Figure 7C Its VIIC-VIIC cross-sectional view is shown in Figure 7D Its VIID-VIID cross-sectional view is shown in . The high-frequency line of this embodiment is a grounded coplanar line, and its basic structure is formed by sequentially stacking a lower ground electrode 702 , a dielectric layer 704 , a signal electrode 705 and an upper ground electrode 706 on an SI-InP substrate 701 . In addition, as shown in the lateral cross-sectional view, the optical waveguide cores 703 of the InP-based semiconductor intersect with each other in the form of crossing the high-frequency line.
[0063] As described in the first embodiment, the dielectric constant between the lower-layer ground electrode 702 and the signal electrode 705 is locally changed due to the presence of ...
no. 3 approach
[0071] In addition, in Figure 9A A top view of a grounded coplanar line according to a third embodiment of the present invention is shown in Figure 9B Its IXB-IXB sectional view is shown in the Figure 9C Its IXC-IXC cross-sectional view is shown in Figure 9D Its LCD-LCD cross-sectional view is shown in the figure. like Figure 9A As shown, the width of the signal electrode 905 is the same, the width of the upper ground electrode 906 in the optical waveguide intersection region is enlarged, and the interval between the signal electrode 905 and the upper ground electrode 906 may be changed, specifically, narrowed. In the case of the compensation structure (narrow SG gap electrode), such as Figure 8B As shown, the effect of suppressing the rise in characteristic impedance and the effect of suppressing the increase in excess electrical loss were also confirmed.
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