Exhausting system of display equipment and regulation mechanism for exhausting system

Abstract

The invention discloses an exhausting system of display equipment and a regulation mechanism for the exhausting system. An air flow channel is formed in the shell of the regulation mechanism; a first opening and multiple second openings are formed in the two ends of the air flow channel respectively; the area of the first opening is larger than that of the second openings; and the first opening or the second openings are connected with an exhaust port of the exhausting system in a matching manner. On the basis, the exhausting system can perform uniform exhausting for the display equipment, so that the problem of resistor line breaking caused by air flow turbulence in a developing cavity can be avoided, thereby lowering the probability of circuit pattern open circuit in an etching process.

Description

technical field [0001] The invention relates to the field of display technology, in particular to an exhaust system of a developing device and an adjusting mechanism thereof. Background technique [0002] In the prior art, TFT (Thin Film Transistor, Thin Film Transistor) is generally manufactured through a photoresist process. The current photoresist process includes multiple processes such as coating photoresist, exposure, development, and etching. In the development process, the exhaust of the developing equipment is very important. For example, when the exhaust flow of the developing equipment is unstable, the air flow disorder in the developing chamber is prone to occur, which leads to the bombardment of the developing steam in advance before the coating of the developing solution is completed. On the photoresist of the substrate, because the photoresist is extremely sensitive to the developer, it will cause some photoresist on the substrate to be developed to be develop...

AI Technical Summary

Problems solved by technology

In the development process, the exhaust of the developing equipment is very important. For example, when the exhaust flow of the developing equipment is unstable, the air flow disorder in the developing chamber is prone to occur, which leads to the bombardment of the developing steam in advance before the coating of the developing solution is completed. On the photoresist of the substrate, because the photoresist is extremely sensitive to the developer, it will cause some photoresist on the substrate to be developed to be developed in advance, resulting in the exposure of the area that should be protected by the photoresist, and thus the problem of photoblocking lines. This is undoubtedly It will cause disconnection of circuit patterns such as TFTs in the subsequent etching process

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