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A Robust Measurement Method for Displacement of Compliant Positioning Platform

A technology of positioning platform and measurement method, which is applied in the direction of measuring device, image analysis, image enhancement, etc., and can solve the problems of low precision, inability to measure the displacement of rotating targets, poor ability to resist light and noise changes, etc.

Active Publication Date: 2019-05-14
SOUTH CHINA UNIV OF TECH
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Problems solved by technology

[0005] The purpose of the present invention is to overcome the deficiencies of the prior art and provide a robust measurement method for the displacement of a compliant positioning platform. This method can effectively solve the problem of complex installation of equipment in traditional measurement methods, the inability to perform simultaneous measurement of multiple degrees of freedom, and resistance to light and noise. Problems such as poor changing ability, low precision and inability to measure the displacement of rotating targets

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  • A Robust Measurement Method for Displacement of Compliant Positioning Platform
  • A Robust Measurement Method for Displacement of Compliant Positioning Platform
  • A Robust Measurement Method for Displacement of Compliant Positioning Platform

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Embodiment Construction

[0072] The content of the present invention will be further described below in conjunction with the accompanying drawings and specific embodiments, but the actual application form of the present invention is not limited to the following embodiments.

[0073] see figure 1 As shown, a robust measurement method for the displacement of a compliant positioning platform provided in this embodiment includes the following steps:

[0074] 1) Using the RPT algorithm to obtain the circular projection vectors of the template image and the image to be tested respectively, including the following steps:

[0075] 1.1) Represented in the polar coordinate system

[0076] Select a template image with a size of 256×256, and express it as T(x,y) in the Cartesian coordinate system, and further express it in the polar coordinate system by converting:

[0077] x=r·cosθ

[0078] y=r·sinθ

[0079]

[0080] In the formula, θ represents the included angle, (x, y) is the coordinate of the pixel in...

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Abstract

The invention discloses a robust measurement method for the displacement of a flexible positioning platform, which comprises the steps of 1) acquiring circular projection vectors of a template image and an image to be measured respectively by adopting an RPT algorithm; 2) rebuilding a circular projection vector model to correct a noise interference item and an illumination interference item for the two circular projection vectors in the step 1); 3) finding the maximum similarity position in the step 2) by using a normalized correlation function and a matching position verification strategy, wherein the maximum similarity position is the integer-level pixel displacement; 4) further adopting an image gradient function based sub-pixel algorithm to acquire the sub-pixel-level displacement by using the result of the step 3); 5) calculating according to the results in the step 3) and the step 4) to obtain a final displacement value. The robust measurement method realizes accurate measurement for the displacement of the flexible micro-nano positioning system by adopting the corrected RPT algorithm and the image gradient function based sub-pixel-level displacement measurement method.

Description

technical field [0001] The invention relates to the technical field of digital image processing and image precision measurement, in particular to a robust measurement method for the displacement of a compliant positioning platform. Background technique [0002] The compliant positioning platform occupies an important position in the field of micro-nano manipulation. Due to the existence of the compliant mechanism, the positioning platform has the characteristics of no assembly, few connecting hinges, good lubrication, and no friction. It has been widely used in the fields of microsurgery, microassembly and micromanufacturing. Many scholars at home and abroad have done research on the compliant positioning platform. Generally, when we evaluate the performance of the compliant positioning platform, we regard the displacement as a very important index. However, due to the special structure of the compliant mechanism, it is extremely difficult to measure the micro-displacement...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/02G06T7/70
CPCG01B11/02G06T7/70G06T2207/10004
Inventor 张宪民张翔
Owner SOUTH CHINA UNIV OF TECH
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