Cleaning jig

Abstract

The invention discloses a cleaning jig. The cleaning jig is used for cleaning photoresistance congelation formed in high temperature baking equipment when a CF substrate is manufactured; the cleaning jig comprises a power supply part, a cleaning liquid storing part and a cleaning liquid atomization part connected in sequence, and the end, far from the cleaning liquid storing part, of the cleaning liquid atomization part is provided with a cleaned part; the power supply part and the cleaning liquid part are provided with handles, and the handles can slide relative to the power supply part and the cleaning liquid storing part in the direction far from or close to the cleaning liquid atomization part to make the cleaning jig have extension performance; under the action of the power supply part, cleaning liquid stored in the cleaning liquid storing part flows to the cleaning liquid atomization part and forms cleaning liquid spray, and the cleaning liquid spray is sprayed to the cleaned part to moisturize the cleaned part. Compared with a cleaning method in the prior art, the cleaning jig omits manual climbing work, lowers the work danger of staff, also simplifies the cleaning process, and improves the cleaning efficiency.

Description

technical field [0001] The invention belongs to the technical field of liquid crystal display panel production, and specifically relates to a cleaning jig for cleaning photoresist condensate in high-temperature baking equipment during the production process of CF substrates. Background technique [0002] In the production process of CF substrates in liquid crystal display panels, high-temperature baking equipment is generally used; during the long-term production of CF substrates in this high-temperature baking equipment, there will be more photoresist volatiles in the high-temperature baking equipment Condensation at the barrier plate deteriorates the internal environment of the equipment and affects product yield; therefore, it is necessary to clean the top of the high-temperature baking equipment. The current cleaning methods are all manual cleaning by workers climbing up, but the height of the equipment is relatively high, and the top is generally about 6.5m, which is no...

AI Technical Summary

Problems solved by technology

[0002] In the production process of CF substrates in liquid crystal display panels, high-temperature baking equipment is generally used; during the long-term production of CF substrates in this high-temperature baking equipment, there will be more photoresist volatiles in the high-temperature baking equipment Condensation on the barrier plate will deteriorate the internal environment of the equipment and affect the product yield; therefore, it is necessary to clean the top of the high-temperature baking equipment

The current cleaning methods are manual cleaning by workers climbing up, but the height of the equipment is relatively high, and the top is generally about 6.5m. It is not only difficult to operate manually, but also has certain dangers.

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