A kind of preparation method of β-gallium oxide nanometer array
A nanoarray, gallium oxide technology, applied in nanotechnology, nanotechnology, nanotechnology for materials and surface science, etc., can solve the problems of long response time, high dark current, unfavorable application and promotion, etc., and achieve the preparation method. Simple, cheap and easy to promote
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Embodiment 1
[0023] This embodiment prepares β-gallium oxide nanoarrays according to the following steps:
[0024] 1. Preparation of GaOOH seed layer by water bath method:
[0025] (1) Configure gallium nitrate (Ga(NO 3 ) 3 ) and hexamethylenetetramine (HMT), the concentration of gallium nitrate is controlled to be 0.5mol / L, the concentration of HMT is 1mol / L, and the volume of the mixed solution is 30mL;
[0026] (2) Place the quartz substrate growth side down in a 50mL beaker filled with the above mixed solution for growth, control the water bath temperature to 90°C, and grow for 8 hours;
[0027] (3) Take it out after natural cooling, rinse with deionized water, and dry to obtain a GaOOH seed layer. Such as figure 1 As shown, the GaOOH seed layer is granular and densely arranged.
[0028] 2. Preparation of GaOOH nanoarrays by hydrothermal method:
[0029] (1) Configure Ga(NO 3 ) 3 With the mixed solution of HMT, the concentration of gallium nitrate is controlled to be 0.06mol / L,...
Embodiment 2
[0034] This embodiment prepares β-gallium oxide nanoarrays according to the following steps:
[0035] 1. Preparation of GaOOH seed layer by water bath method:
[0036] (1) Configure gallium nitrate (Ga(NO 3 ) 3 ) and hexamethylenetetramine (HMT), control the concentration of gallium nitrate to 0.4mol / L, the concentration of HMT to 0.5mol / L, and the volume of the mixed solution to 30mL;
[0037] (2) C-Al 2 o 3 Place the substrate growth side down in a 50mL beaker filled with the above mixed solution for growth, control the temperature of the water bath at 85°C, and grow for 6 hours;
[0038] (3) Take it out after natural cooling, rinse with deionized water, and dry to get the following figure 1 The GaOOH seed layer is shown.
[0039] 2. Preparation of GaOOH nanoarrays by hydrothermal method:
[0040] (1) Configure Ga(NO 3 ) 3 With the mixed solution of HMT, the concentration of gallium nitrate is controlled to be 0.1mol / L, the concentration of HMT is 0.1mol / L, and the ...
Embodiment 3
[0045] This embodiment prepares β-gallium oxide nanoarrays according to the following steps:
[0046] 1. Preparation of GaOOH seed layer by water bath method:
[0047] (1) Configure gallium nitrate (Ga(NO 3 ) 3 ) and hexamethylenetetramine (HMT), control the concentration of gallium nitrate to 0.2mol / L, the concentration of HMT to 0.6mol / L, and the volume of the mixed solution to 30mL;
[0048] (2) Place the FTO substrate growth side down in a 50mL beaker filled with the above mixed solution for growth, control the water bath temperature to 95°C, and grow for 8 hours;
[0049] (3) Take it out after natural cooling, rinse with deionized water, and dry to get the following figure 1 The GaOOH seed layer is shown.
[0050] 2. Preparation of GaOOH nanoarrays by hydrothermal method:
[0051] (1) Configure Ga(NO 3 ) 3 With the mixed solution of HMT, the concentration of gallium nitrate is controlled to be 0.05mol / L, the concentration of HMT is 0.3mol / L, and the volume of mixed...
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