Extended interaction klystron and production method thereof
A technology of extended interaction and klystrons, applied in the field of extended interaction klystrons, which can solve the problems of high power density in the cavity, low power density in the cavity, high output performance, etc., achieve high output performance and reduce the risk of breakdown , the effect of high modulation efficiency
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[0053] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.
[0054] This embodiment takes the 0.34THz extended interaction klystron as an example, from figure 2 It can be seen that the extended interaction klystron of this embodiment includes 5 resonant cavities, namely input resonant cavity 1, three intermediate resonant cavities 2 and output resonant cavity 3, and the cross-sections of all resonant cavities are equal in area Dumbbell-shaped structure ( image 3 ), the longitudinal section dimension is at Figure 4 to Figure 8 given in. The length of the drift section 7 connecting two adjacent resonators is 0.6mm, the operating voltage of the electron beam is 16kV, the operating current is 0.4A, and the guiding magnetic field adopts a uniform magnetic field with a strength of 0.8T.
[0055] from image 3 It can be seen that the width W1 of all resonant cavities is 0.7mm, and the width W2 of the mid...
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