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A long-pulse high-power ion source electrode grid cooling water circuit and vacuum sealing structure

A vacuum-sealed structure and cooling waterway technology, which is applied to circuits, ion beam tubes, discharge tubes, etc., can solve the problems that the cooling structure cannot be applied to the neutral beam ion source and has high requirements for compactness, so as to reduce processing costs and save space , the effect of reducing the size

Active Publication Date: 2019-06-18
SOUTHWESTERN INST OF PHYSICS +1
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Problems solved by technology

At present, the ion source developed by our institute is mainly used in a neutral beam injector composed of four ion sources, so the requirements for the compactness of the overall space structure of a single ion source are relatively high. At present, the EAST neutral beam ion source is the first The cooling structure of the electrode cannot be applied to the neutral beam ion source developed by our institute

Method used

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  • A long-pulse high-power ion source electrode grid cooling water circuit and vacuum sealing structure
  • A long-pulse high-power ion source electrode grid cooling water circuit and vacuum sealing structure
  • A long-pulse high-power ion source electrode grid cooling water circuit and vacuum sealing structure

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Embodiment Construction

[0021] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments.

[0022] The high-power ion source electrode system is composed of multi-layer water-cooled electrode grids 2 and their supporting flanges 1. Each layer of water-cooled electrode plates is composed of two overlapping water-cooled electrode grids 2 with the same structure. The first layer of electrode grids has the largest area , the thickness is the smallest, this embodiment takes the first electrode water channel structure of the HL-2M tokmak neutral beam ion source circular hole four-electrode system as an example.

[0023] This waterway structure consists of two main parts, one is the supporting flange 1 with 2 main waterways and 16 branch waterways inside, and the other is a large-area thin-walled flange with 16 main waterways and 40 branch waterways inside. Water-cooled electrode grid 2. The water channel is arranged parallel to t...

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Abstract

The invention relates to the technical field of high-power high-current ion source and neutral beam injection heating, and particularly relates to a long-pulse high-power ion source electrode grid cooling water circuit and vacuum sealing structure. The structure is formed by assembling multiple layers of water-cooled electrode grids and a support flange thereof in parallel. Each layer of water-cooled electrode plate is composed of two water-cooled electrode grids of the same structure lapped together. The structure further comprises cooling water circuits inside the support flange and cooling water circuits inside the water-cooled electrode grids. By using the structure, electrodes can be cooled instantaneously, and the uniformity of electric field distribution between electrode grid plates is ensured. Moreover, a water pipe connecting the electrodes and the flange is omitted, a connecting structure of the water pipe and the electrodes is omitted, space is saved, the size of the flange and the overall vacuum cavity including an insulating cavity is reduced, and the processing cost is lowered. The technical scheme is especially suitable for a compact ion source first electrode water circuit structure.

Description

technical field [0001] The invention belongs to the technical field of high-power high-current ion source and neutral beam injection heating, and in particular relates to a long-pulse high-power ion source electrode grid cooling water circuit and a vacuum sealing structure. Background technique [0002] The ion source is a device that ionizes neutral atoms or molecules, generates plasma, and draws an ion beam from it. It is an indispensable part of various types of ion accelerators, mass spectrometers, electromagnetic isotope separators, ion implanters, ion beam etching devices, ion thrusters, and neutral beam implanters in controlled fusion devices. An ion source generally consists mainly of a plasma generator and an electrode system. When the beam energy is greater than 60keV, the high power ion source electrode system usually consists of four layers of electrodes and their supporting flanges. Each layer of electrodes has hundreds of diameters of circular cross-section e...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J27/02
CPCH01J27/022
Inventor 邹桂清曹建勇阚存东
Owner SOUTHWESTERN INST OF PHYSICS
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