Temperature sensing diode structure integrated on transistor and its preparation method
A diode and transistor technology, applied in the field of temperature sensing diode structure and its preparation, can solve the problems of incomplete compatibility of transistor technology, increase of production cost, complex structure of power semiconductor modules, etc., and achieve improved anti-interference ability, reliability and safety work, to avoid the effect of inductance effect
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[0044] see figure 1 , 2 As shown, in the temperature sensing diode structure integrated on the transistor of the present invention, the active area of the silicon wafer 1 is sequentially connected with a first oxide layer 6 and a first polysilicon layer 8 on the upper part thereof, and the first oxide layer 6 As the isolation layer 6-2 of the polysilicon gate 8-2, the first polysilicon layer 8 is the polysilicon gate 8-2 of the transistor, and the silicon chip 1 has a first dopant connected to the silicon chip 1 in the source cell of the active area. The doped region 3 and the second doped region 2 connected in the first doped region 3, the emitter 12 is connected to the first doped region 3 and the second doped region 2, and the gate 13 is connected to the polysilicon gate 8-2 , And the first polysilicon layer 8 is processed as the first doped region 8-3 of the diode of the present invention. The upper part of the first polysilicon layer 8 is sequentially connected with the s...
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