Apparatus and method for measuring wave aberration
A measuring device and technology of wave aberration, which is applied in the direction of photographic plate-making process exposure device, testing optical performance, microlithography exposure equipment, etc., can solve the problem that the size of the small hole should not be too large, reduce the contrast of the image plane, and the transmittance of light intensity Low-level problems, to achieve the effect of improving manufacturability, increasing interference area, and reducing acquisition time
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[0036] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be noted that all the drawings of the present invention are in simplified form and use inaccurate scales, and are only used to facilitate and clearly assist the purpose of illustrating the embodiments of the present invention.
[0037] Such as figure 2 As shown, the wave aberration measurement device provided by the present invention includes: a light source 10, an illumination system 20, an object plane module 30 and an image plane detection unit 40, and the object plane module 30 includes an object plane grating 301 and an object plane order selection plate 302. The image plane detection unit 40 includes an image plane grating 401, an image plane order selection plate 402, and a detector 404. Both the object plane grating 30...
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