Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Automatic leakage monitoring and repair system for chemical plant device

A technology for repairing systems and automatic monitoring, applied in measuring devices, manufacturing computing systems, liquid tightness measurement using liquid/vacuum degree, etc., to save costs, reduce leakage risks, and avoid high-hazard production accidents

Active Publication Date: 2017-05-10
BEIJING VIREADY TECH CO LTD +1
View PDF5 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The prior art also lacks a device for automatic monitoring and repairing of fugitive emissions in chemical plants

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Automatic leakage monitoring and repair system for chemical plant device
  • Automatic leakage monitoring and repair system for chemical plant device
  • Automatic leakage monitoring and repair system for chemical plant device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0049] Embodiments of the present invention are described in detail below, and examples of the embodiments are shown in the drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary and are intended to explain the present invention and should not be construed as limiting the present invention.

[0050] Such as figure 1 As shown, the automatic leakage monitoring and repair system for chemical plant equipment in the embodiment of the present invention includes: sealing point database 1, working condition database 2, expert knowledge subsystem 3, automatic monitoring and evaluation subsystem 4, repair task management Subsystem 5.

[0051]Specifically, the sealing point database 1 is used to store sealing point data. The working condition database 2 is used to store the working condition data of each equipment i...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides an automatic leakage monitoring and repair system for a chemical plant device. The system comprises a seal point database, a working condition database, an expert knowledge subsystem, a leakage risk database, an automatic monitoring and evaluation subsystem and a repair task management subsystem, wherein the repair task management subsystem receives a task instruction, transmits the task instruction to a corresponding repair worker, and after a repair task is completed, sends a task complete instruction to the automatic monitoring and evaluation subsystem around a device corresponding to the repair task; the automatic monitoring and evaluation subsystem acquires monitoring data of a surrounding environment of the device, and automatically estimates a fugitive emission amount of the device area; if the fugitive emission amount exceeds a normal value, a new seal point repair task is further increased; and if the estimated emission amount is smaller than the normal value, there is no serious leakage point. The system reduces the leakage risk, effectively reduces the emission, realizes all-weather real-time online monitoring, and timely generates a repair task to remind an enterprise of quick repair.

Description

technical field [0001] The invention relates to the technical field of chemical monitoring, in particular to an automatic leakage monitoring and repair system for chemical plant equipment. Background technique [0002] In recent years, as VOCs (volatile organic compounds, volatile organic compounds) emission pollution has attracted increasing attention, the LDAR detection method, as a basic detection method for fugitive emissions, has been widely used in the VOC emission control of domestic environmental protection departments. The contribution value of an enterprise's VOCs emissions (that is, the percentage of the total VOCs emissions) usually consists of two parts, namely organized emissions and unorganized emissions. The prior art also lacks an automatic monitoring and repairing device for fugitive emissions in chemical plants. Contents of the invention [0003] The aim of the present invention is to solve at least one of said technical drawbacks. [0004] Therefore, ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01M3/02G01D21/02G06Q10/00G06Q50/04
CPCY02P90/30G01M3/02G01D21/02G06Q10/20G06Q50/04
Inventor 李兴华
Owner BEIJING VIREADY TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com