Face mask

A face mask and face towel technology, applied in clothing, clothing, protective clothing, etc., can solve the problems of long wearing time and feeling uncomfortable, and achieve the effect of wearing comfort and reducing pressure.

Inactive Publication Date: 2017-05-10
毕宪亮
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Masks are indispensable items in people's daily life. They not only block dust or breath, but also can block certain germs. However, most of the current masks are

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Face mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0010] A mask as shown in the accompanying drawings, it includes a face towel 1, hangers 2 are arranged on the upper ends of both sides of the face towel 1, a convex support 3 is arranged on the bridge of the nose, and a rope 4 is arranged on the lower end of the mask.

[0011] The end of the hanger 2 has a curved buckle, and the curved buckle is a smooth surface.

[0012] Described rope 4 comprises left and right two of face towel, and rope end is provided with nylon thread buckle, and two ropes can be flexibly connected.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a face mask, and relates to an article for daily life. The face mask comprises a facial towel, wherein hanging racks are arranged at the upper ends of two sides of the facial towel; a convex support is arranged on a position in correspondence to a nose bridge; and ropes are arranged at the lower end of the face mask. The hanging racks, which are similar to spectacle frames, can be hung on ears; by virtue of the convex support, compression on the nose bridge can be relieved; and by virtue of the ropes, the lower end of the facial towel is fixed, so that the face mask, in comparison with a normal face mask, is more comfortable to wear.

Description

technical field [0001] The invention relates to a daily necessities, in particular to a face mask. Background technique [0002] Masks are indispensable items in people's daily life. They not only block dust or breath, but also can block certain germs. However, most of the current masks are masks with rope buckles, which are tightly bound on the face, ears, and The face is oppressed to a certain extent, and it feels very uncomfortable to wear it for too long. Contents of the invention [0003] The object of the present invention is to provide a mask with reasonable structure and comfortable wearing. [0004] The utility model relates to a mask, which includes a face towel, hangers are arranged at the upper ends of both sides of the face towel, a convex support is arranged at the bridge of the nose, and a rope is arranged at the lower end of the mask. [0005] The end of the hanger has a bent buckle, and the bent buckle is a smooth surface. [0006] The said rope include...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): A41D13/11
Inventor 毕宪亮
Owner 毕宪亮
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap