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Method for growing manganese dioxide nano wall film on conductive substrate

A conductive substrate, manganese dioxide technology, applied in the direction of nanotechnology, hybrid capacitor electrodes, hybrid/electric double layer capacitor manufacturing, etc., can solve the problems of cumbersome production steps, easy agglomeration growth, weak adhesion, etc. Chemical properties, simple preparation method, strong adhesion effect

Active Publication Date: 2017-03-22
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Such as CN103065806A announced on the nickel foam by electrochemical deposition technology deposition sodium ion intercalation type MnO 2 The method of nanosheet structure, but the implementation of this method needs to use electric energy, and the MnO on the current collector foam nickel 2 Nanosheets have weak adhesion and are easy to aggregate and grow. For large-area growth of MnO 2 It is difficult to control; CN102502851A announced the synthesis of MnO on metal titanium substrates by hydrothermal technology 2 The method of nanosheet or nanorod, but the synthesis process requires high temperature and high pressure, high energy consumption, high production cost, and the nanostructure is easy to form vertical overlapping, reducing the MnO 2 Utilization rate is difficult to control and is not conducive to large-scale production; similarly, CN104658765A grows a variety of nanostructure MnO on stainless steel non-woven fabric base by hydrothermal synthesis combined with subsequent high-temperature heat treatment 2 and other metal oxides, including nanorods, nanowires, nanoneedles, etc. However, the production steps of this patent are cumbersome, the energy consumption of the hydrothermal process and high-temperature heat treatment process is high, and the quality and shape of the active material on the current collector are difficult to control

Method used

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  • Method for growing manganese dioxide nano wall film on conductive substrate
  • Method for growing manganese dioxide nano wall film on conductive substrate
  • Method for growing manganese dioxide nano wall film on conductive substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] (1) Select size 2.5×2.5 cm 2 1. The FTO conductive glass with a thickness of 2.2 mm is the conductive substrate. After the surface of the conductive substrate is cleaned with absolute ethanol, it is washed with deionized water ultrasonically and dried.

[0023] (2) Fully dissolve potassium permanganate in deionized water to prepare a potassium permanganate solution with a molar concentration of 0.20 M; under constant stirring, add 4 ml of a hydrochloric acid solution with a molar concentration of 0.01 M drop by drop Add it to 50ml of potassium permanganate solution, and mix the potassium permanganate solution and hydrochloric acid solution evenly to obtain a reaction solution.

[0024] (3) Immerse the clean conductive substrate obtained in step (1) in the reaction solution prepared in step (2), and react for 72 hours at 40 °C in an electric blast constant temperature drying oven. After the reaction, clean and dry with deionization Ultrasonic vibration washing, and then...

Embodiment 2

[0027] (1) Select size 2.5×2.5 cm 2 1. A metal titanium sheet with a thickness of 0.1 mm is used as a conductive substrate. After the surface of the conductive substrate is pickled, it is ultrasonically cleaned with deionized water and dried.

[0028] (2) Fully dissolve potassium permanganate in deionized water to prepare a potassium permanganate solution with a molar concentration of 0.15 M; under constant stirring, add 4 ml of a hydrochloric acid solution with a molar concentration of 0.01 M drop by drop Add it to 50 ml of potassium permanganate solution, and mix the potassium permanganate solution and hydrochloric acid solution evenly to obtain a reaction solution.

[0029] (3) Immerse the clean conductive substrate obtained in step (1) in the reaction solution prepared in step (2), and react in an electric blast constant temperature drying oven at 60 °C for 48 hours. After the reaction, clean and dry with deionization Ultrasonic vibration washing, and then completely dry ...

Embodiment 3

[0032] (1) Select size 2.5×2.5 cm 2 1. A metal titanium sheet with a thickness of 0.1 mm is used as a conductive substrate. After the surface of the conductive substrate is pickled, it is ultrasonically cleaned with deionized water and dried.

[0033] (2) Fully dissolve potassium permanganate in deionized water to prepare a potassium permanganate solution with a molar concentration of 0.20 M; under constant stirring, add 4 ml of a hydrochloric acid solution with a molar concentration of 0.01 M drop by drop Add it to 50 ml of potassium permanganate solution, and mix the potassium permanganate solution and hydrochloric acid solution evenly to obtain a reaction solution.

[0034] (3) Immerse the clean conductive substrate obtained in step (1) in the reaction solution prepared in step (2), and react for 72 hours at 60 °C in an electric blast constant temperature drying oven. After the reaction, clean and dry with deionization Ultrasonic vibration washing, and then completely dry ...

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Abstract

The invention discloses a method for growing a manganese dioxide nano wall film on a conductive substrate which comprises the step of immersing the conductive substrate with a clean surface in a reaction solution prepared from potassium permanganate solution and hydrochloric acid at a temperature of 40 to 100 degrees centigrade, after the reaction, cleaning and drying the product with deionized water. The method is simple, controllable in nano film morphology and dimension, low in cost and low in energy consumption, and the manganese dioxide nano wall supported on the conductive substrate has uniform size and strong adhesion. The prepared MnO2 nanowall film can be used directly as an electrode and is expected to be used in the fields of energy and environment such as catalyst or adsorbent carrier, separation material, magnetic material, oxidative degradation material, desulfurization or air purification material.

Description

technical field [0001] The invention relates to a method for growing a manganese dioxide nano-wall film, in particular to a method for growing a manganese dioxide nano-wall film on a conductive substrate. Background technique [0002] Supercapacitor is a new type of energy storage device, which combines the advantages of traditional capacitors and secondary batteries, and has a wide range of applications in various fields of social economy. Electrode materials for supercapacitors are mainly divided into three categories: carbon-based materials, metal oxides and their oxygen oxides, and conductive polymers. Carbon-based materials are the main electrode materials for commercialized supercapacitors because of their abundant sources, large specific surface area, good electrical conductivity, high power density, and low cost. However, their energy density is low and their self-discharge current is large. limit. Metal oxides and conductive polymers have high specific capacitance...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01G11/86H01G11/24H01G11/46B82Y40/00
CPCB82Y40/00H01G11/24H01G11/46H01G11/86Y02E60/13
Inventor 顾伊杰吴进明
Owner ZHEJIANG UNIV
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