Photochromic ceramic tile and preparation method thereof
A photochromic, ceramic tile technology, applied in the field of quartz stone, can solve the problems of single, not having multiple functions, and limiting the scope of application
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Embodiment 1
[0035] A photochromic ceramic tile and a preparation method thereof, the preparation method comprising the following steps:
[0036] Step A, preparing the bottom glaze: by mass percentage, 30% frit, 7% functional agent, 26% lithium china stone, 5% zirconium silicate, 20% kaolin and 12% quartz are mixed evenly, wet ball milled, passed 300~350 mesh sieve to get slurry bottom glaze;
[0037] Step B, prepare the surface glaze: by mass percentage, mix 72% frit, 1% conductive powder, 20% kaolin, 5% alumina, 1% zinc oxide and 1% zirconium silicate evenly, wet ball mill, pass After 300~350 mesh sieve, the pasty surface glaze is obtained;
[0038] In step C, the bottom glaze and top glaze prepared in steps A and B are glazed successively on the clay of the ceramic tile by means of glazing; then fired in a kiln at a firing temperature of 800-900°C and a firing cycle of 45 minutes to obtain ceramics brick;
[0039] Wherein, the frit is prepared by the following method: by weight perce...
Embodiment 2
[0051] A photochromic ceramic tile and a preparation method thereof, the preparation method comprising the following steps:
[0052] Step A, preparing the bottom glaze: by mass percentage, 32% frit, 5% functional agent, 24% lithium china stone, 6% zirconium silicate, 22% kaolin and 11% quartz are mixed evenly, wet ball milled, passed 300~350 mesh sieve to get slurry bottom glaze;
[0053] Step B, prepare the surface glaze: mix 70% frit, 3% conductive powder, 15% kaolin, 7% alumina, 1% zinc oxide and 3% zirconium silicate evenly by mass percentage, wet ball mill, pass After 300~350 mesh sieve, the pasty surface glaze is obtained;
[0054] In step C, the bottom glaze and top glaze prepared in steps A and B are glazed successively on the clay of the ceramic tile by means of glazing; then fired in a kiln at a firing temperature of 800-900°C and a firing cycle of 45 minutes to obtain ceramics brick;
[0055] Wherein, the frit is prepared by the following method: by weight percen...
Embodiment 3
[0067] A photochromic ceramic tile and a preparation method thereof, the preparation method comprising the following steps:
[0068] Step A, preparing the bottom glaze: by mass percentage, 34% frit, 3% functional agent, 18% lithium china stone, 10% zirconium silicate, 25% kaolin and 10% quartz are mixed evenly, wet ball milled, passed 300~350 mesh sieve to get slurry bottom glaze;
[0069] Step B, prepare the surface glaze: by mass percentage, mix 63% frit, 5% conductive powder, 20% kaolin, 8% alumina, 1% zinc oxide and 3% zirconium silicate, wet ball mill, pass After 300~350 mesh sieve, the pasty surface glaze is obtained;
[0070] In step C, the bottom glaze and top glaze prepared in steps A and B are glazed successively on the clay of the ceramic tile by means of glazing; then fired in a kiln at a firing temperature of 800-900°C and a firing cycle of 45 minutes to obtain ceramics brick;
[0071] Wherein, the frit is prepared by the following method: by weight percentage,...
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