Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for self-assembly of nanomaterials to form a substrate with a ring pattern and the formed substrate with a ring pattern and applications

A technology of nanomaterials and ring patterns, which is applied in the field of self-assembly of nanomaterials to form substrates with ring patterns, which can solve the problems of high cost and complicated process

Active Publication Date: 2019-01-22
BEIJING INST OF NANOENERGY & NANOSYST
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to overcome the defects of complex process and high cost in the existing method of forming ring patterns from nanomaterials, and provide a very simple and cheap nanomaterial self-assembly method to form a base with ring patterns. Sheet method and substrate with annular pattern formed therefrom and applications

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for self-assembly of nanomaterials to form a substrate with a ring pattern and the formed substrate with a ring pattern and applications
  • Method for self-assembly of nanomaterials to form a substrate with a ring pattern and the formed substrate with a ring pattern and applications
  • Method for self-assembly of nanomaterials to form a substrate with a ring pattern and the formed substrate with a ring pattern and applications

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0053] This embodiment is used to illustrate the substrate with a ring pattern and its assembly method of the present invention.

[0054] use figure 1 device, wherein the base material is polystyrene, and polystyrene is also used to form an annular outer wall around the base material, thus forming such as figure 1 The circular dish shown (35mm in diameter) was cleaned ultrasonically with deionized water, followed by ethanol and blown dry with nitrogen.

[0055] Multi-walled carbon nanotubes (purchased from Shenzhen Nanotech Port Co., Ltd, L-MWNT-1020 grade, 10-20 nm in diameter, about 2-5 μm in length) and SDBS (the mass ratio of multi-walled carbon nanotubes and SDBS is 0.1 : 1) adding into water and ultrasonically dispersing for 4 hours to obtain a dispersion A1 with a carbon nanotube concentration of 0.3 mg / mL.

[0056] Add the dispersion A1 to the above-mentioned circular vessel, so that the distance between the bottom surface of the formed meniscus and the base material...

Embodiment 2

[0058] This embodiment is used to illustrate the substrate with a ring pattern and its assembly method of the present invention.

[0059] According to the method described in Example 1, the difference is that the base material is polystyrene after the surface is gold-plated, and the annular pattern formed on the base is as follows: image 3 As shown, the ring distribution of the ring pattern formed on the substrate is: from the center to the edge, followed by smooth circular line distribution, wavy line distribution, and a certain connection distribution between the rings, and the single ring width is 10-30 μm. The ring spacing is 10-100 μm.

Embodiment 3

[0061] This embodiment is used to illustrate the substrate with a ring pattern and its assembly method of the present invention.

[0062] According to the method described in embodiment 1, the difference is that the base material is glass, and the annular pattern formed on the base is as Figure 4 As shown, the single ring is a smooth circular line distribution, the single ring width is 5-40 μm, and the ring spacing is 50-200 μm.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
sizeaaaaaaaaaa
sizeaaaaaaaaaa
sizeaaaaaaaaaa
Login to View More

Abstract

The invention relates to a method used for obtaining a substrate with annular patterns via nano material self-assembling. The method comprises following steps: a non-volatile nano material is dispersed in an invasive volatile solvent so as to obtain a nano material dispersion liquid; the nano material dispersion liquid is placed on a substrate material in a concave meniscus manner or a semi-concave meniscus manner; and the invasive volatile solvent is removed via evaporation. The invention also provides the substrate with annular patterns prepared via the method. The invention also provides applications of the substrate in cell culturing, preparation of field effect transistors, preparation of Bragg reflectors, and preparation of electrodes. The substrate with annular patterns can be prepared simply and cheaply via the method.

Description

technical field [0001] The invention relates to a method for self-assembling a nanometer material to form a substrate with a ring pattern, and the formed substrate with a ring pattern and its application. Background technique [0002] Carbon nanotubes have excellent electrical conductivity, optical properties, mechanical properties, structural properties and biocompatibility. As a material for semiconductor and conductor devices, it has broad application prospects in nanoelectronic devices, nanosensors, and nanoscale transistors. Its excellent biocompatibility also has great potential in cell tissue culture, sustained release of drugs, and directed differentiation of stem cells. Carbon nanotube patterns with a certain geometric shape (carbon nanotube linear pattern, wavy pattern, ring pattern, mesh pattern, etc.) are more widely used in electronics, Bragg resonators, optoelectronic communications and tissue engineering scaffolds. is broad. However, the traditional methods...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B81C1/00B81B1/00B82Y30/00
Inventor 李舟李虎江文王心心田静静闫岭
Owner BEIJING INST OF NANOENERGY & NANOSYST
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products