Method and apparatus for continuous supply of precursor
A technology of precursors and equipment, applied in separation methods, chemical instruments and methods, evaporator regulation/control, etc., can solve problems such as complex coating equipment
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[0025] figure 1 First, a first exemplary embodiment of a device 1 for continuous precursor supply according to the invention is shown schematically. The plant 1, as part of a coating plant, in particular a plasma coating plant, has a plurality of extraction devices 2, 3 for supplying metal strips or individual goods (not shown here) The coating module of the coating is not shown here. In the extraction devices 2, 3 of the coating module (not shown here), the precursor 6 is withdrawn, for example atomized, from the inlet lines 2c, 3c of the respective extraction device by the inflow of the process gas 2b, 3b and fed (not shown) out of the coating module. In the inlet pipes 2 c , 3 c , which are at least partially configured as risers, the precursor level P is decisive for the amount of precursor removed by the extraction devices 2 , 3 as a function of the parameters of the process gas 2 b , 3 b. Consequently, the precursor level P in the feed lines 2c, 3c is kept as constant...
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