Method for judging cloud-to-ground lightning high-risk section of line corridor in combination with topographic parameters
A technology for line corridors and terrain parameters, applied in structured data retrieval, geographic information databases, data processing applications, etc., can solve the problem of low practical value, no consideration of topographic features, analysis of cloud-to-ground lightning parameter distribution and lightning strike status of line corridors Low efficiency and other issues
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0082] In the following, the present invention will be further described in detail in conjunction with an example of judging high-risk sections of cloud flashes in corridors of transmission lines above 330kV in a certain area.
[0083] The present invention combines terrain parameters to determine the method for high-risk sections of cloud-to-ground flashes in line corridors, comprising the following steps:
[0084] (1) Based on about 2.6 million pieces of positioning data of 3 or more stations in a certain region’s lightning monitoring system from 2005 to 2012, and about 110,000 artificial lightning records from meteorological observation stations in the region from 1998 to 2012, the lightning Day T d and flash density N g Fitting the relationship, we get
[0085] T d Based on 30 lightning days, N g =2.58 times / (km 2 · a), sort out the line through N g ≥2.5 times / (km 2 ·A) mine damage risk assessment for sections of the area, that is, for Ng2 ·A) The line section in ...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com