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Preparation of cocr/ti extreme ultraviolet multilayer artificial crystal monochromator by nitrogen reactive sputtering and its manufacturing method

A technology of artificial crystals and manufacturing methods, which is applied in the direction of using multiple reflections to generate spectra and spectrum generation, and can solve problems such as poor film quality

Active Publication Date: 2018-04-17
SUZHOU HONGCE PHOTOELECTRIC TECH CO LTD
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  • Description
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  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is exactly to overcome the above-mentioned defects such as the poor film-forming quality of the existing multilayer artificial crystal and proposes a multilayer artificial crystal prepared by nitrogen reactive sputtering process, with metal CoCr as the absorbing layer, and Ti as the absorbing layer. Multilayer artificial crystal monochromator with spacer layer and precise control of thickness ratio of CoCr and Ti to improve its film quality and reflectivity and its manufacturing method

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  • Preparation of cocr/ti extreme ultraviolet multilayer artificial crystal monochromator by nitrogen reactive sputtering and its manufacturing method
  • Preparation of cocr/ti extreme ultraviolet multilayer artificial crystal monochromator by nitrogen reactive sputtering and its manufacturing method

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Embodiment Construction

[0022] The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0023] The manufacture method of CoCr / Ti extreme ultraviolet multilayer film artificial crystal monochromator, such as figure 1 As shown, firstly, a monocrystalline silicon wafer (with a crystal orientation of (100)) or glass is selected as the substrate 1 of the monochromator, and the roughness of the substrate is 0.2-0.5 nanometers. Then a Cr film layer with a thickness of 5-10 nanometers is plated on the substrate as the primer layer 2 . CoCr film layer 3 and Ti film layer 4 are alternately plated on the primer layer 2 to form CoCr / Ti periodic multilayer film artificial crystal 5, the number of cycles is 50-100, and the ratio of the thickness of CoCr to the thickness of Ti is 1:1 , the first layer plated in the periodic multilayer artificial lens 5 is a CoCr layer with a thickness of about 1-5 nm, and the last layer is a Ti layer with a t...

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Abstract

The present invention relates to a CoCr / Ti extreme ultraviolet multilayer film intraocular crystal monochromator prepared through nitrogen reactive sputtering and a manufacturing method thereof. A bond coat is plated on an extra smooth silicon wafer or a glass substrate, CoCr / Ti film layers are alternately plated to form a CoCr / Ti periodical multilayer film intraocular lens, and then the periodical multilayer film intraocular lens is plated with C or B4 to be taken as a protective layer. The optical constants of the CoCr / Ti materials in the extreme ultraviolet band are appropriate, and the CoCr / Ti multilayer film intraocular lens monochromator has excellent optical performances; and moreover, the CoCr / Ti multilayer film intraocular lens monochromator is able to accurately control the thickness ratio of the CoCr / Ti film layers and reduce the roughness of the interface of the multilayer film intraocular lens through addition of nitrogen in the working gas so as to avoid the mutual diffusion between the film layers. The CoCr / Ti extreme ultraviolet multilayer film intraocular lens monochromator prepared through nitrogen reactive sputtering is suitable for application of the extreme ultraviolet band such as fluorescence detection, plasma diagnosis and the like.

Description

technical field [0001] The invention belongs to the field of manufacturing precision optical elements, and in particular relates to a multi-layer artificial crystal monochromator with Ti as a spacer layer and CoCr as a reflection layer applied in the extreme ultraviolet band and a manufacturing method thereof. Background technique [0002] In the electromagnetic spectrum, the extreme ultraviolet band is a special band between vacuum ultraviolet and soft X-rays, with a wavelength ranging from a few nanometers to tens of nanometers. In the extreme ultraviolet region, all materials have a refractive index close to 1, which means that light hardly refracts in the medium. And there is strong absorption, so that the normal incidence reflectance of the single-layer film is very low, at 10 -4 The order of magnitude cannot meet practical needs. This is the main difficulty in advancing conventional optical systems to the extreme ultraviolet region. The lack of high-performance opti...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01J3/26
CPCG01J3/26
Inventor 朱京涛朱圣明金长利朱运平
Owner SUZHOU HONGCE PHOTOELECTRIC TECH CO LTD
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