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Modified adsorbent and application of same in preparation of ultra-pure hexafluoroethane

A technology of hexafluoroethane and adsorbent, applied in the field of modified adsorbent, can solve problems such as being unsuitable for industrial production, and achieve the effects of no secondary pollution, high adsorption efficiency, and large adsorption capacity

Inactive Publication Date: 2016-02-17
ZHEJIANG LANTIAN ENVIRONMENTAL PROTECTION HI TECH +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method can only remove HFC-125, HFC-143a and HFC-134a, and adopts intermittent operation, which is not suitable for industrial production

Method used

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  • Modified adsorbent and application of same in preparation of ultra-pure hexafluoroethane
  • Modified adsorbent and application of same in preparation of ultra-pure hexafluoroethane
  • Modified adsorbent and application of same in preparation of ultra-pure hexafluoroethane

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] Weigh 10g of 4A (NaA) molecular sieve powder, and 0.1mol / L concentration of AgNO 3The solution was mixed at a solid-to-liquid ratio of 1:3, and stirred at 80°C for 4h. Filter molecular sieves, and add fresh AgNO at a concentration of 0.1mol / L again at a solid-to-liquid ratio of 1:3 3 The solution is ion exchanged. This process is repeated 4 times to ensure that Na + completely covered by Ag + Exchange, that is, the degree of exchange is 100%. Filter the solid and wash with distilled water until Ag-free + . Dry at 110°C for 8 hours. Take a certain amount of sample in the gas-solid phase adsorption device, at 350 ° C, N 2 Activate in situ in the atmosphere for 2 hours, and pass raw material gas hexafluoroethane to remove impurities after cooling down.

Embodiment 2-3

[0035] Weigh 10g13X (NaX) and NaY molecular sieve powder respectively, and mix with 0.1mol / L concentration AgNO 3 The solution was mixed at a solid-to-liquid ratio of 1:3, and stirred at 80°C for 4h. Filter molecular sieves, and add fresh AgNO at a concentration of 0.1mol / L again at a solid-to-liquid ratio of 1:3 3 The solution is ion exchanged. This process is repeated 4 times to ensure that Na + completely covered by Ag + Exchange, that is, the degree of exchange is 100%. Filter the solid and wash with distilled water until Ag-free + . Dry at 110°C for 8 hours. Take a certain amount of sample in the gas-solid phase adsorption device, at 350 ° C, N 2 Activate in situ in the atmosphere for 2 hours, and pass raw material gas hexafluoroethane to remove impurities after cooling down.

Embodiment 4

[0037] Weigh 10gSiO 2 and 20gAgNO 3 The solid was ground in a ball mill for 60 minutes, then taken out, and baked at 350°C for 8 hours to promote AgNO 3 in SiO 2 The surface is dispersed. Take a certain amount of sample in the gas-solid phase adsorption device, at 350 ° C, N 2 Activate in situ in the atmosphere for 2 hours, and pass raw material gas hexafluoroethane to remove impurities after cooling down.

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PUM

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Abstract

The invention discloses an adsorbent modified through an ion exchange method, ball milling method or impregnation method. The adsorbent is selected from a group consisting of an A type molecular sieve, an X type molecular sieve, a Y type molecular sieve, SiO2, Al2O3 and active carbon AC. The modified adsorbent provided by the invention is applicable to removal of organic impurities in a crude hexafluoroethane product and enables an ultra-pure hexafluoroethane product with a purity of no less than 99.999% to be obtained.

Description

technical field [0001] The invention relates to an adsorbent, in particular to a modified adsorbent which can be used to prepare ultra-high-purity hexafluoroethane. Background technique [0002] Hexafluoroethane, code-named R116 or FC-116, is a colorless, odorless, non-flammable gas, mainly used in low-temperature refrigeration, electronic cleaning and etching industries. When it is used as etching and cleaning gas in the semiconductor industry, its purity has a decisive impact on component performance and product yield. Even a small amount of impurities entering the process will lead to a rapid increase in product failure rate. Therefore, The market is increasingly demanding the purity of electronic gases. [0003] In the crude FC-116 product, possible organic impurities include: chlorotrifluoromethane (CFC-13 or R13), trifluoromethane (HFC-23 or R23), difluoromethane (HFC-32 or R32), pentafluoromethane Chlorofluoroethane (R115 or CFC-115), pentafluoroethane (HFC-125 or R...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J20/18B01J20/10B01J20/08B01J20/20B01J20/30B01J20/32C07C17/389C07C19/08
Inventor 张金柯白占旗齐海徐娇何双材胡欣
Owner ZHEJIANG LANTIAN ENVIRONMENTAL PROTECTION HI TECH
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