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Cap printing and embroidering pattern covering process

A hat cover and pattern technology, applied in embroidery machines, embroidery machine mechanisms, textiles and papermaking, etc., can solve the problems of printing paste carry-out and the like

Inactive Publication Date: 2016-02-03
SIYANG JIEFENG CAP IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The technical problem to be solved by the present invention is to provide a printing and embroidery pattern process for overlaying hats, which solves the problem of taking out the printing paste during the embroidery process, ensures the quality of overprinting and embroidery pattern hats, and improves the aesthetics of the hats

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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  • Cap printing and embroidering pattern covering process

Examples

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Embodiment Construction

[0012] Such as figure 1 As shown, the hat body is made of multiple pieces of cloth 1 stitched together, and the printed pattern 2 and embroidery pattern 3 in the front straddle the two pieces of cloth, and the printed pattern 2 is printed on the cloth before the stitching of the cloth 1 Yes, because the hat has a certain curvature, in order not to deform the pattern after seaming, the printed pattern needs to be deformed in pieces, and the embroidery pattern 3 is embroidered as a whole after the stitching of the cloth pieces is completed.

[0013] The process of printing and embroidery patterns for hat sleeves according to the present invention comprises the following steps:

[0014] (1) Divide the printed pattern into two halves according to the stitching line of the cloth pieces, and deform them respectively through computer image processing software. The inner deformation of the printed pattern stitching matches the radian of the cloth pieces;

[0015] (2) The deformed pri...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Abstract

The invention discloses a cap printing and embroidering pattern covering process. In a printing pattern deformation printing process, an embroidering pattern position which is not deformed on a printing pattern is remained; under the precondition that the pattern is not deformed after a cap subjected to separated printing and whole embroidering is spliced, the embroidered embroidering pattern has no paste; a covered printing and embroidering pattern is clean and beautiful and has no quality defects.

Description

technical field [0001] The invention relates to the field of cap production technology, in particular to a cap sleeve printing and embroidery pattern technology. Background technique [0002] Printing patterns on hats and embroidering partial embroidery patterns on the printed patterns are common design methods to improve the aesthetics of hats. Since the hat as a whole is in the shape of an arc that gradually shrinks upward in the radial direction of the outsole, it is basically made of multiple pieces of cloth. Printing and embroidery patterns are located between the seams and span two pieces of cloth. The current production process is generally as follows: First, the printing pattern is divided into two halves, and then slightly deformed by computer image processing software. The inner side of the printing pattern is connected with the cloth pieces before the seam The radians are matched, and then the two half-width printing patterns are printed on the two pieces of clot...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): D05C17/00
Inventor 陈前军
Owner SIYANG JIEFENG CAP IND
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