Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Planting system

Technology of a planting system, vegetal wall, applied in the field of pads with pouches

Inactive Publication Date: 2015-12-09
迈克尔茨温佛
View PDF6 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Another challenge lies in the planting of the plants in the vertical plane

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Planting system
  • Planting system
  • Planting system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0114] In all the drawings, the same reference numerals denote the same details.

[0115] according to figure 1 The implant system includes a multi-layered pad 1 with a capsule, which may have a thickness of 1 m 2 The area is extended. Fully expand and install the cushion 1 with the bladder. The mat 1 with sacs is shown together with the inserted plant cuttings 14 which respectively have a blade portion 14b located in front of the woven first layer 3 and a root portion 14a located behind the woven first layer 3. In addition, the planting system includes an installation device 11 having a water collection channel 12 and an edge closure 13.

[0116] The planting system designed as a plant wall system is constructed as follows (see image 3 ): The medium used for the plant stem 14 is a pad 1 with a sac with a sac 2 which includes a gel filling 6 and an integrated irrigation pipe 7. The gel particles of the cushion 1 with capsules are transformed into pure hydrogel 6 in the pool, for...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a multi-layer mat having pouches (21) for cultivating plants (31) for interior and exterior greening which forms at least one pouch compartment and contains a woven first layer (36) made of crossing strands (34) having elastic properties. The woven first layer (36) forms at least one intersection point (32) at which at least two strands (34) cross, wherein by elastic stretching of the strands (34) the at least one intersection point (32) forms a temporary planting opening (33) for the insertion of a cutting or caudex (31).

Description

Technical field [0001] The invention relates to the field of planting systems. The present invention relates to a planting system, in particular a multi-layered cushion with sacs (Beutelmatte), which is used to accommodate plant cuttings or plant stems. The planting system is mainly designed for internal space greening and plant walls in external space greening, and can realize growth without soil, clay balls or other solid substrates, for example. Background technique [0002] Planting systems for growing plants in vertical planes are known in the prior art. For example, this kind of planting system for the greening of internal space and free space can realize space-saving greening on the one hand, and on the other hand, it can also determine the artistic style. In the case of small space requirements, the conversion to vertical can especially realize large-scale planting. In addition to the above-mentioned advantages, the vertical planting system also has the characteristics...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A01G9/02A01G1/00
CPCA01G9/025A01G1/005Y02P60/244A01G20/20Y02P60/20
Inventor 迈克尔·茨温佛娜塔莉·戈麦斯
Owner 迈克尔茨温佛
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products