A shielding plate and reaction chamber

Abstract

The invention provides a shielding plate and a reaction chamber. The shielding plate includes a rotating part and a body. The rotating part includes a fixed end and a movable end. Orientation setting, the movable end of the rotating part is located at the original position under the action of its own gravity, and the original position is defined as the position of the movable end when the angle between the lower surface of the rotating part and the lower surface of the body is a preset obtuse angle, When using the shielding disk to shield the object to be shielded, the movable end of the rotating section is lifted from the original position to the preset highest position, so that the rotating section and the main body form a shielding disk that can shield the object to be shielded. The shielding plate provided by the present invention has a small size during storage, so there is no need to set up a garage in the reaction chamber to place the shielding plate, thereby reducing the chamber cost of the reaction chamber and improving economic benefits.

Description

technical field [0001] The invention belongs to the technical field of semiconductor equipment manufacturing, and in particular relates to a shielding plate and a reaction chamber. Background technique [0002] Physical vapor deposition (Physical Vapor Deposition, hereinafter referred to as PVD) equipment is a relatively widely used plasma processing equipment, which is mainly used to deposit thin films on the surface of workpieces to be processed such as substrates. PVD methods include vacuum evaporation, sputtering coating, and arc plasma coating, and, so far, PVD methods can not only deposit metal films, but also deposit alloy films, compound films, ceramic films, semiconductor films, etc. [0003] In practical applications, usually before the deposition process is performed, it is necessary to perform a cleaning process on the target exposed to the atmosphere or out of service for a period of time (that is, to clean the oxide or other impurities formed on the surface of ...

AI Technical Summary

Problems solved by technology

[0006] The present invention aims to solve the technical problems existing in the prior art, and provides a shielding plate and a reaction chamber. The size of the shielding plate is small when stored, so there is no need to set up a garage in the reaction chamber to place the shielding plate. Thus, the chamber cost of the reaction chamber can be reduced, which in turn can improve economic efficiency

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