Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for constructing shaping field source based on metal scattering body assisting

A construction method and scatterer technology, applied in special data processing applications, instruments, electrical digital data processing, etc., can solve problems such as excessive side lobe values, shaped field passivation, etc.

Inactive Publication Date: 2015-07-29
UNIV OF ELECTRONICS SCI & TECH OF CHINA
View PDF2 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The invention provides a method for constructing a shaped field source based on metal scatterers, which is used to solve the problems of too many side lobes, too high side lobe values, and passivation of shaped fields in electromagnetic field shaping using time inversion technology

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for constructing shaping field source based on metal scattering body assisting
  • Method for constructing shaping field source based on metal scattering body assisting
  • Method for constructing shaping field source based on metal scattering body assisting

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0050] This embodiment provides a method for implementing an L-shaped shaped field source assisted by metal scatterers. First, according to step 1 of the technical solution, construct an L-shaped basic shaped field source. The specific method is to discretize the L-shaped geometry, such as image 3 As shown, the spacing D of its discrete sampling points is required to be slightly less than half a wavelength (60mm), so D=59mm in the present invention; secondly, arrange the scatterers according to the steps of the technical solution and related theories, and realize the scatterers based on metal scatterers. Shaped field source construction:

[0051] (1) Make sure that the position of the metal scatterer is around the shaped field source, such as figure 1 As shown, the distance between the metal scatterer and the shaped field source dw=0.2×D;

[0052] (2) Determine the distance between the metal scatterers themselves. The distance between most adjacent metal scatterers is the s...

Embodiment 2

[0064] This embodiment provides an implementation method of a T-shaped shaped field source assisted by metal scatterers, which is the same as the implementation method of an L-shaped shaped field source assisted by metal scatterers. First, construct a T-shaped basic shaped field source, such as Figure 7 As shown, it is composed of 13 spatially discrete array elements, and the array element spacing is also D (59mm); secondly, the structure is based on the shaped field source assisted by metal scatterers, such as figure 2 As shown, at the position dw=0.2×D away from the basic shaped field source, the metal scatterers are arranged according to the steps of the technical solution of the present invention; the distance between most of the scatterers is D the same as the distance between the shaped field source array, and the special position is the corner According to the principle of straight line intersection, the intersection point is the spatial position of the scatterer, dw3...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a method for constructing a shaping field source based on metal scattering body assisting, and belongs to the technical field of electromagnetic wave space propagation and control. The method is different from the method which uses the simple space discrete array for building the shaping field source. The novel method for constructing the shaping field source by adding a simple metal scattering body around the space discrete array or outside the shaping field area is provided on the basis of the electromagnetic scattering wave random phase cancelling principle in a composite medium space, and is used for sharpening an edge field of the shaping field and reducing the problem of excessive and overhigh side lobes outside the area. The method has the advantages that the geometric boundary of the shaping field can be sharpened, the problem of the side lobes outside the shaping field area can be effectively solved, the operation and implementing are simple and convenient, the complicated and time-wasted space field calculation and number optimizing are not needed, and the constructing difficulty of the high-quality shaping field source is greatly simplified.

Description

technical field [0001] The invention belongs to the field of space propagation and control of electromagnetic waves, and in particular relates to a method for optimizing the structure of a shaped field source in electromagnetic field shaping. Background technique [0002] The application of electromagnetic waves in the fields of communication, medical treatment, and industry has made people pay attention to and study the propagation control technology of electromagnetic waves. Antennas and their arrays, metamaterials, and circuit devices are all ways to control wave propagation, mainly through various This method controls the propagation direction of the wave, that is, the control of the pattern. With the continuous expansion of the application range of electromagnetic waves, especially in the fields of biology, medicine, chemistry, industry, etc., the research on various control problems of "wave field" has begun to attract the attention of scholars. The regeneration of th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06F17/50
Inventor 赵德双朱敏孙虎
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com