Device for detecting abnormity of deionized water cleaning valve in semiconductor process technology

A technology for deionized water and cleaning valves, which is applied in the direction of measuring devices, grinding devices, manufacturing tools, etc., and can solve the problems of inability to detect damage and blockage of deionized water cleaning valves in real time

Inactive Publication Date: 2015-07-22
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In the prior art, abnormal working conditions such as damage and blockage of the deionized water cleaning valve cannot be detected in real time

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Device for detecting abnormity of deionized water cleaning valve in semiconductor process technology

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0011] The present invention will be further elaborated below by describing a preferred specific embodiment in detail in conjunction with the accompanying drawings.

[0012] Such as figure 1 As shown, a device for detecting the abnormality of the deionized water cleaning valve in the semiconductor manufacturing process is installed in three deionized water cleaning control units, and each of the deionized water cleaning control units includes a cleaning valve 1, respectively The liner high-pressure flushing unit 2 and the liner adjustment cleaning unit 3 connected to the cleaning valve 1 through pipelines, the device includes: three flow monitoring components 4, which are respectively arranged between the cleaning valve 1 and the liner high-pressure flushing unit 2 Monitor the flow rate of deionized water on the pipe between. The flow monitoring component 4 is a flow meter.

[0013] When the semiconductor chemical mechanical polishing equipment (CMP) is flattening or polishi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a device for detecting abnormity of a deionized water cleaning valve in a semiconductor process technology. The device is mounted in a plurality of deionized water cleaning control units, and each deionized water cleaning control unit comprises a cleaning valve body, a gasket high-pressure flushing unit and a gasket adjusting cleaning unit; and the cleaning valve bodies, the gasket high-pressure flushing units and the gasket adjusting cleaning units are connected in sequence through pipelines. The device comprises a plurality of flow monitoring components, and the flow monitoring components are correspondingly arranged on the pipelines between the cleaning valve bodies and the gasket high-pressure flushing units respectively and monitor the flowing speed of deionized water. The flow monitoring components are flowmeters. The device can detect the flow speed and the pressure of the deionized water in real time, and therefore abnormal conditions of damage, blockage and the like of the deionized water cleaning valve can be detected in time.

Description

technical field [0001] The invention relates to the field of semiconductor chemical mechanical polishing, in particular to a device for detecting abnormality of a deionized water cleaning valve in a semiconductor manufacturing process. Background technique [0002] Wafers ground by semiconductor chemical mechanical polishing equipment often have a high rate of defective products. One of the important factors is the abnormality of the cleaning valve of the high-pressure flushing unit of the control liner and the liner adjustment cleaning unit, which is manifested by the pressure of deionized water. too low. [0003] In the prior art, abnormal working conditions such as damage and blockage of the deionized water cleaning valve cannot be detected in real time. Contents of the invention [0004] The purpose of the present invention is to provide a device for detecting the abnormality of the deionized water cleaning valve in the semiconductor manufacturing process. A flow mete...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B24B37/005G01M13/00
CPCB24B37/005B24B37/34
Inventor 陈洪雷张中连
Owner SHANGHAI HUAHONG GRACE SEMICON MFG CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap