Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Chassis assembly for polycrystalline silicon reduction furnace

A reduction furnace and polysilicon technology, applied in the direction of silicon, etc., can solve the problems of chassis temperature difference stress, long coolant flow, poor cooling effect, etc., and achieve the effects of not easy temperature difference stress and deformation, uniform radial temperature distribution, and good cooling effect

Inactive Publication Date: 2015-06-24
CHINA ENFI ENGINEERING CORPORATION
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Although the large-scale polysilicon reduction furnace in the related art solves some problems of output and energy consumption, along with the enlargement and complexity of the equipment, the flow resistance of the coolant in the chassis increases, resulting in poor cooling effect, and due to The flow of coolant is long, and the radial temperature distribution of the chassis is uneven, resulting in temperature difference stress and deformation of the chassis

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Chassis assembly for polycrystalline silicon reduction furnace
  • Chassis assembly for polycrystalline silicon reduction furnace

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0020] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary and are intended to explain the present invention and should not be construed as limiting the present invention.

[0021] A chassis assembly 10 for a polysilicon reduction furnace according to an embodiment of the present invention will be described below with reference to the accompanying drawings.

[0022] Such as figure 1 with figure 2 As shown, the chassis assembly 10 for a polysilicon reduction furnace according to an embodiment of the present invention includes a chassis body 100 , a plurality of electrode holders 200 , a plurality of intake pipes 300 and a plurality of exhaust pipes 400 .

[0023] Six spiral flow channels 110 are de...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a chassis assembly for a polycrystalline silicon reduction furnace. The chassis assembly for the polycrystalline silicon reduction furnace comprises a chassis body, a plurality of electrode holders, a plurality of air inlet pipes and a plurality of air exhaust pipes, wherein six spiral flow passages, which are spiraled from the center of the chassis body to the outer peripheral edge of the chassis body, are defined in the chassis body, coolant inlets and at least six coolant outlets, which are communicated with the six spiral flow passages, are formed in the chassis body, and the coolant inlets are located at the center of the chassis body; the electrode holders are arranged on the chassis body; the air inlet pipes and the air exhaust pipes are arranged on the chassis body. The chassis assembly for the polycrystalline silicon reduction furnace, disclosed by the embodiments of the invention, has the advantages that the coolant flow resistance is low, the cooling effect is good, the radial temperature distribution is uniform, temperature difference stress and deformation are difficultly generated, and the like.

Description

technical field [0001] The invention relates to the technical field of polysilicon production, in particular to a chassis assembly for a polysilicon reduction furnace. Background technique [0002] The polysilicon reduction furnace is the core equipment for producing the final product in the production of polysilicon, and it is also the key link that determines the system capacity and energy consumption. Small polysilicon reduction furnaces (such as 12 pairs of rods, 18 pairs of rods, etc.) generally consume high energy consumption per unit weight of products, and the output of a single furnace is relatively low, which has become less and less suitable for the current market requirements. With the improvement of polysilicon equipment level With continuous development and improvement, large-scale reduction furnaces have been continuously developed, and 36 pairs of rods, 48 ​​pairs of rods and even 60 pairs of rods have appeared. [0003] Although the large-scale polysilicon ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C01B33/03
Inventor 姚心汪绍芬
Owner CHINA ENFI ENGINEERING CORPORATION
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products