Vertical graphene nanoribbon and preparation thereof, and application of vertical grapheme nanoribbon in preparation of supercapacitor
A technology of graphene nanobelts and single-walled carbon nanotubes, which is applied in the field of carbon nanomaterials preparation to achieve the effects of short preparation time, reduced energy consumption, and loose requirements
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Embodiment 1
[0039] Embodiment 1: The CVD furnace used in the present invention is a hot wire-CVD furnace.
[0040] (1) Silicon wafers were ultrasonically cleaned with methanol, acetone and isopropanone for 15 minutes, N 2 blow dry. 10nm Al was sequentially evaporated by an electron beam evaporation system (E-Beam Evaporator) 2 o 3 , 0.8nm Fe.
[0041] (2) Set the furnace temperature to 700°C and the gas flow rates to H 2 :200sccm, C 2 h 2 : 1.8 sccm, H through deionized water 2 It is 200sccm, and the total air pressure is 25Torr. The heating wire is a single tungsten wire with a power of 30W. Place the silicon wafer prepared in (1) at 0.4 in front of the tungsten wire, set the power of the tungsten wire to 0 after 30 seconds of reaction, adjust the total air pressure to 6.4 Torr, and complete the vertical array growth of single-walled carbon nanotubes after 15 minutes of reaction.
[0042] (3) Replace a single tungsten wire with 4 tungsten wires, set the furnace temperature to 70...
Embodiment 2
[0044] Embodiment 2: The CVD furnace used in the present invention is a hot wire-CVD furnace.
[0045] (1) Silicon wafers were ultrasonically cleaned with methanol, acetone and isopropanone for 15 minutes, N 2 blow dry. Evaporate 11nm Al sequentially by E-Beam Evaporator 2 o 3 , 1nm Fe.
[0046] (2) Set the furnace temperature to 750°C and the gas flow rates to H 2 :210sccm, C 2 h 2 : 2.5 sccm, H through deionized water 2 It is 200sccm, and the total air pressure is 25Torr. The heating wire is a single tungsten wire with a power of 35W. Place the silicon wafer prepared in (1) 0.3 cm in front of the tungsten wire, set the power of the tungsten wire to 0 after 30 s of reaction, adjust the total air pressure to 6.4 Torr, and complete the vertical array growth of single-walled carbon nanotubes after 15 min of reaction.
[0047] (3) Replace a single tungsten wire with 4 tungsten wires, set the furnace temperature to 700°C, and the gas flow to H 2 :200sccm, CH 4 : 0.1 scc...
Embodiment 3
[0049] Embodiment 3: The CVD furnace used in the present invention is a hot wire-CVD furnace.
[0050] (1) Silicon wafers were ultrasonically cleaned with methanol, acetone and isopropanone for 15 minutes, N 2 blow dry. Evaporate 10nm Al sequentially by E-Beam Evaporator 2 o 3 , 1.2nm Fe.
[0051] (2) Set the furnace temperature to 760°C and the gas flow rates to H 2 :210sccm, C 2 h 2 : 2.2 sccm, H through deionized water 2 It is 200sccm, and the total air pressure is 25Torr. The heating wire is a single tungsten wire with a power of 35W. Place the silicon wafer made in (1) 0.3 cm in front of the tungsten wire. After 30 seconds of reaction, set the power of the tungsten wire to 0, adjust the total air pressure to 6.4 Torr, and complete the vertical array growth of single-walled carbon nanotubes after 15 minutes of reaction.
[0052] (3) Replace a single tungsten wire with 4 tungsten wires, set the furnace temperature to 700°C, and the gas flow to H 2 :210sccm, CH 4 ...
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