Metal oxide semiconductor gas sensor and preparation method thereof
A technology of oxide semiconductors and gas sensors, which is applied in the direction of instruments, scientific instruments, measuring devices, etc., can solve the problems of sensor sensitivity drop, sensor body resistance drift, and reduce the service life of sensors, so as to prevent drift, improve service life, and high The effect of detection accuracy
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Embodiment 1
[0068] Prepare the nickel oxide bulk resistance layer as the first film layer by magnetron sputtering, control the coating time and coating power, so that the thickness of the nickel oxide bulk resistance layer is 600nm, the cross-sectional electron microscope diagram of the obtained nickel oxide bulk resistance layer is as follows Figure 5 As shown, the surface electron microscope image is shown in Image 6 As shown; then the nickel oxide nanowall was prepared as the second film layer by chemical water bath deposition method, and the coating time was controlled so that the thickness of the nanowall was 1 μm, and a formaldehyde gas sensor with a double-layer detection layer was obtained. The formaldehyde gas sensor in this embodiment shows good gas-sensing characteristics to formaldehyde gas, and the specific corresponding characteristic diagram is as follows Figure 7 shown.
Embodiment 2
[0070] The nickel oxide body resistance layer was prepared by magnetron sputtering as the first film layer, and the coating time and coating power were controlled so that the thickness of the nickel oxide body resistance layer was 350nm; then the nickel oxide nanowall was prepared by chemical water bath deposition as the second film layer. Thin film layer, control the water bath deposition time, so that the thickness of the nano wall is 1.5 μm, and the formaldehyde gas sensor with the double-layer structure of the detection layer is obtained, wherein the cross-sectional electron microscope diagram of the detection layer is as follows Figure 8 As shown, the surface electron microscope image is shown in Figure 9 shown. from Figure 8 with Figure 9 It can be seen from the comparison that the second thin film layer located on the surface obviously has a larger specific surface area than the first thin film layer.
Embodiment 3
[0072] A nickel oxide bulk resistive layer was prepared by laser pulse deposition as the first film layer, and the coating time and laser power were controlled so that the thickness of the nickel oxide bulk resistive layer was 1 μm; nickel oxide nanowires were then prepared by electrospinning as the second thin film layer, and the spinning time was controlled so that the thickness of the nanowires was 50 μm, and a formaldehyde gas sensor with a double-layer detection layer was prepared. As a comparison with Example 2, the response of the gas sensor in formaldehyde gas when the nickel oxide nanowire sensitive layer is not provided is as follows: Figure 10 As shown, there is only a weak response under high concentration of formaldehyde gas.
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