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Photosensitive imaging composition containing amide phenolic compound or its oligomer

An imaging composition and compound technology, applied in the field of photosensitive materials, can solve the problems of decreased ink affinity, inability to reduce other properties of the plate, loss of ink affinity of the plate, etc., and achieves light solubility, isopropanol resistance and Good alkali resistance and high sensitivity

Active Publication Date: 2016-07-06
LUCKY HUAGUANG GRAPHICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although this method has achieved certain effects, there are still some shortcomings: first, because many carboxyl groups are introduced, the ink affinity of the photosensitive imaging composition system is greatly affected. When acrylic resins were used in the past, the content of acrylic acid When the ink affinity of the plate is 30%, the ink affinity of the plate is greatly reduced, and when the ink affinity is greater than 50%, the ink affinity of the plate is almost completely lost. This problem also exists when the resin of the ester carboxylic acid system is used
[0004] All in all, whether it is using modified phenolic resin, namely ester carboxylic acid resin or adding low molecular weight additives, these methods have some shortcomings more or less, and they cannot increase the sensitivity of the plate without reducing the other properties of the plate. performance

Method used

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  • Photosensitive imaging composition containing amide phenolic compound or its oligomer
  • Photosensitive imaging composition containing amide phenolic compound or its oligomer
  • Photosensitive imaging composition containing amide phenolic compound or its oligomer

Examples

Experimental program
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Effect test

Synthetic example 1

[0059] Add 75g of glacial acetic acid to a 250ml three-necked round-bottomed flask equipped with mechanical stirring, a thermometer, and a reflux condenser. After stirring and heating up to 60-70°C, add 50.5g (0.5mol) of p-aminophenol within 5-10min. -20min to heat up to 115-125°C and maintain the reaction at this temperature for 5-6h, add 70ml of deionized water after cooling to room temperature, a purple solid precipitates, filter with suction, wash with water until neutral, dry at 50°C, and finally obtain light purple Fine granular product C-A, yield 61.9%.

Synthetic example 2

[0061] Add 150g of glacial acetic acid and 150g of saturated sodium acetate aqueous solution into a 500ml three-necked round-bottomed flask equipped with mechanical stirring and a thermometer, add 45g (0.413mol) of p-aminophenol under stirring, and place it in an ice-water bath to cool down after it is almost completely dissolved. to 0-5°C, and then began to drop 46.6g (0.413mol) of chloroacetyl chloride, the temperature was maintained at 0-5°C during the dropwise addition, and the dropwise addition was completed within 1.5-2.0h. Afterwards, the reaction was maintained at 20-30°C for 2-3h, and after cooling, it was directly suction-filtered, washed with water until neutral, and dried at 50°C to obtain the white powdery solid product C-B with a yield of 69.3%.

Synthetic example 3

[0063] 46.6g (0.413mol) of chloroacetyl chloride in Synthesis Example 2 was replaced by 60.8g (0.413mol) of dichloroacetyl chloride, and the remaining reaction and treatment conditions were unchanged to obtain the white powdery solid product C-C with a yield of 67.2%.

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Abstract

The invention relates to a photosensitive imaging composition of an amide phenol-containing compound or an oligomer thereof. The photosensitive imaging composition comprises: 5-25% of a high sensitivity anti-alcohol dissolution promoting additive adopting an amide phenol-containing compound or an oligomer thereof, or 10-40% of a high sensitivity anti-alcohol dissolution promoting additive adopting a composition comprising an amide phenol-containing compound or an oligomer thereof and an ester carboxylic acid resin according to a weight ratio of 1:1-1:2, 40-70% of a film forming resin adopting the material obtained by dissolving a linear phenol formaldehyde resin in a 1% NaOH aqueous solution for 5-20 min, and 15-30% of a photoactivity compound adopting the material obtained by esterifying a phenol formaldehyde resin with 2,1,4-diazonaphthoquinone sulfonyl chloride. The plate material coated with the photosensitive imaging composition of the present invention has characteristics of high sensitivity, good isopropanol resistance and good alkali resistance, and the comprehensive performance of the plate material meets the requirement of the printing plate.

Description

technical field [0001] The invention belongs to the field of photosensitive materials, more specifically, relates to a photosensitive imaging composition for high-sensitivity positive PS plates and UV-CTP plates, especially a photosensitive imaging composition containing amide phenolic compounds or oligomers thereof . Background technique [0002] In the past, in order to improve the sensitivity of positive PS plates and UV-CTP plates, ester carboxylic acid system resins were often used, that is, some phenolic hydroxyl groups of phenolic resins were esterified and some carboxyl groups were introduced to achieve this purpose. The inventors of the present invention synthesized a series of modified phenolic resins containing ketone carbonyl, ester carbonyl and carboxyl carbonyl around 2006. These modified phenolic resins contain at least one of the aforementioned carbonyl groups, the most widely used, the best effect and the most convenient synthesis is the resin with both est...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C07C231/02C07C231/12C07C233/25C07C233/43C07C233/75C07C233/80G03F7/09G03F7/004
Inventor 余尚先杨金瑞丛培军丛军成王大伟邵正春
Owner LUCKY HUAGUANG GRAPHICS
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