Making method of three-dimensional relief anti-fake pattern mother set

Abstract

The invention discloses a making method of a three-dimensional relief anti-fake pattern mother set. The making method sequentially comprises the following steps: (1) design of a three-dimensional relief anti-fake pattern source file, sequentially comprising the steps of (1-1) performing relief treatment on a plane pattern to obtain a relief pattern; (1-2) performing multiple times of selected region establishment on the relief pattern, splitting the relief pattern into a plurality of selected regions; (1-3) filling lines into all selected regions to obtain the three-dimensional relief anti-fake pattern source file; (2) importing the three-dimensional relief anti-fake pattern source file obtained in the step (1) into a control system of a laser labeling machine; and (3) spreading a printing plate material on a working platform of the laser labeling machine and positioning the printing plate material, then starting the laser labeling machine to perform photoetching on the printing plate material, and forming stripes corresponding to the lines in the three-dimensional relief anti-fake pattern source file on one surface of the printing plate material to obtain the three-dimensional relief anti-fake pattern mother set. The making method is simple in making process; equipment with low input cost can realize direct processing and making of the three-dimensional relief anti-fake pattern mother set.

Description

technical field [0001] The invention relates to the technical field of plate making, in particular to a method for making a master plate of a three-dimensional relief anti-counterfeiting pattern. Background technique [0002] At present, there are two methods for the preparation of three-dimensional relief anti-counterfeiting pattern masters: (1) Direct lithography, which requires the processes of coating photosensitive glue, drying, exposure, and development on the glass plate, and is only suitable for shallow stripe relief. pattern; (2) UV imposition method, this method requires processes such as coating photosensitive adhesive, drying, exposing, developing, etc., and when the relief pattern has deep stripes, it is necessary to make a deep stripe plate unit and a light stripe plate unit respectively, and then pass The UV imposition method combines the deep stripe version unit and the light stripe version unit to form a three-dimensional embossed anti-counterfeiting pattern...

AI Technical Summary

Problems solved by technology

[0003] The above two methods for making three-dimensional relief anti-counterfeiting pattern masters all need to go through processes such as coating of photosensitive adhesive, drying, exposure, and development, which belong to indirect plate making. The required equipment is expensive, the technical requirements are harsh, and the production cycle is long, which is difficult to meet. business needs

Images