Quick-drying-type carboxyl-containing photosensitive resin and preparation method thereof
A photosensitive resin, quick-drying technology, applied in photomechanical equipment, patterned surface photoengraving process, photosensitive materials used in optomechanical equipment, etc. , Unable to carry out industrialization promotion and other problems, to achieve the effect of excellent sensitivity and resolution, excellent non-stick chirality, and meet the requirements of high-precision circuit etching
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[0068] (1), add 360g o-cresol novolak epoxy resin, 125g acrylic acid, 2.5g as triphenylphosphine, 450g propylene glycol methyl ether acetate in the 2L detachable flask that possesses thermometer, reflux condenser, stirrer As a solvent, heat up to 115°C for 12 hours, then cool to 60°C, add 250g of phthalic anhydride and 0.8g of p-methoxyphenol as a polymerization inhibitor, heat up to 100°C for 8 hours, then cool down to Add 100 g of glycidyl methacrylate and 0.6 g of hydroquinone as a polymerization inhibitor after 60 ° C, and control the temperature at 95 ° C for 8 hours to obtain a quick-drying carboxyl-containing photosensitive resin of the present invention; The fast-drying carboxyl group-containing photosensitive resin has a solid content of 65wt%, an acid value of 55-65 mgKOH / g, and an average molecular weight of 10,000;
[0069] (2) Add 90g of acrylic acid, 480g of propylene glycol methyl ether acetate into a 2L detachable flask equipped with a thermometer, a reflux con...
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