A Method for Obtaining Optimal Parameters of Phase Mask Applied in Wavefront Coding System
A phase mask and optimal parameter technology, applied in the optical field, can solve problems such as difficulty, loss of signal-to-noise ratio of intermediate blurred images, and degradation of image restoration quality.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0044]The present invention proposes a method for obtaining the optimal parameters of the phase mask applied to the wavefront encoding system. This method incorporates the insensitivity of the phase transfer function PTF to defocus into the target evaluation function, as shown in formula (4) Show. The traditional optimization process based only on the out-of-focus optical transfer function OTF is expressed by formula (5).
[0045] min ( [ a · m 2 + b · n 2 + c · l 2 ] )
[0046] Subjectto∫MTF(u,W 20 =0)du≥Th
[0047]
[0048] min ( ∫ ...
PUM

Abstract
Description
Claims
Application Information

- Generate Ideas
- Intellectual Property
- Life Sciences
- Materials
- Tech Scout
- Unparalleled Data Quality
- Higher Quality Content
- 60% Fewer Hallucinations
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com