A Method for Obtaining Optimal Parameters of Phase Mask Applied in Wavefront Coding System
A phase mask and optimal parameter technology, applied in the optical field, can solve problems such as difficulty, loss of signal-to-noise ratio of intermediate blurred images, and degradation of image restoration quality.
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[0044]The present invention proposes a method for obtaining the optimal parameters of the phase mask applied to the wavefront encoding system. This method incorporates the insensitivity of the phase transfer function PTF to defocus into the target evaluation function, as shown in formula (4) Show. The traditional optimization process based only on the out-of-focus optical transfer function OTF is expressed by formula (5).
[0045] min ( [ a · m 2 + b · n 2 + c · l 2 ] )
[0046] Subjectto∫MTF(u,W 20 =0)du≥Th
[0047]
[0048] min ( ∫ ...
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